Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.38 |
| ▸ | MAPT | P10636 | 4/20 | 0.38 |
| ▸ | THRB | P10828 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.37 |
| ▸ | ATM | Q13315 | 2/20 | 0.36 |
| ▸ | THRA | P10827 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.35 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15024817 | 0.93 | ALDH1A1 (0.40) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL15024816 | 0.91 | ALDH1A1 (0.40) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL15025201 | 0.88 | ALDH1A1 (0.40) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL15014711 | 0.87 | ALDH1A1 (0.43) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL15025065 | 0.86 | ALDH1A1 (0.48) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL15025040 | 0.85 | ALDH1A1 (0.40) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL20827590 | 0.85 | ALDH1A1 (0.41) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL15025027 | 0.84 | ALDH1A1 (0.43) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL13264855 | 0.83 | GLA (0.47) | ALDH1A1GLASMN1; SMN2KMT2AMAPT | |
| SCHEMBL12551027 | 0.80 | KMT2A (0.36) | KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |