SCHEMBL15025633

SCHEMBL15025633

CCC(C)O[Si](CCCN)(OC)OC

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28192079 0.85
SCHEMBL12190486 0.84 CA12 (0.34) LMNA
SCHEMBL1674585 0.83
SCHEMBL5596491 0.82 LMNA (0.32) LMNA
SCHEMBL15025587 0.82 LMNA (0.38) LMNA
SCHEMBL5595661 0.82
Ammonia Solution, Strong SCHEMBL28261410 0.81
SCHEMBL28804831 0.81 LMNA (0.46) LMNA
SCHEMBL3311966 0.81 LMNA (0.31) LMNA
SCHEMBL27489927 0.80 CYP3A4 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9314816-B2 Methods of material hydrophilization by siloxanes containing nitrilopoly (methylenephosphonic acid) or derivatives thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-04-19 US disclosed
US-20130149544-A1 METHODS OF MATERIAL HYDROPHILIZATION BY SILOXANES CONTAINING NITRILOPOLY (METHYLENEPHOSPHONIC ACID) OR DERIVATIVES THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-06-13 US disclosed