SCHEMBL15025587

SCHEMBL15025587

CCCCCC(C)O[Si](CCCN)(OC)OC

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
OPRM1 P35372 1/20 0.35
DNM1 Q05193 8/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
ALDH1A1 P00352 1/20 0.34
TSHR P16473 1/20 0.34
EPHX1 P07099 1/20 0.34
SPHK1 Q9NYA1 1/20 0.34
GNAI3 P08754 1/20 0.33
GNAO1 P09471 1/20 0.33
GNAI1 P63096 1/20 0.33
FAAH O00519 1/20 0.30
CYP3A4 P08684 1/20 0.30
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17903177 0.91 OPRM1 (0.35) LMNAOPRM1DNM1MEN1KMT2A
SCHEMBL28192079 0.86
SCHEMBL31474859 0.84 LMNA (0.41) LMNAOPRM1DNM1ALDH1A1SPHK1
SCHEMBL28177343 0.84 OPRM1 (0.37) OPRM1DNM1MEN1KMT2AALDH1A1
SCHEMBL2761426 0.83 LMNA (0.41) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL15025633 0.82 LMNA (0.31) LMNA
SCHEMBL27501978 0.82 LMNA (0.40) LMNAOPRM1DNM1MEN1KMT2A
SCHEMBL28550781 0.82 LMNA (0.40) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL27923950 0.80 LMNA (0.35) LMNA
SCHEMBL920285 0.80 CYP3A4 (0.33) OPRM1DNM1MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160312065-A1 METHODS OF MATERIAL HYDROPHILIZATION BY GLYCIDOL-CONTAINING SILOXANES SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-10-27 US disclosed
US-9403183-B2 Methods of material hydrophilization by glycidol-containing siloxanes SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-08-02 US disclosed
US-9314816-B2 Methods of material hydrophilization by siloxanes containing nitrilopoly (methylenephosphonic acid) or derivatives thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-04-19 US disclosed
US-20130267652-A1 METHODS OF HYDROPHOBIZING MATERIALS WITH SILOXANES CONTAINING HYDROCARBYLIMINOALKYL OR QUATERNARY AMMONIUM SALTS SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-10-10 US disclosed
US-20130149545-A1 METHODS OF MATERIAL HYDROPHILIZATION BY GLYCIDOL-CONTAINING SILOXANES SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-06-13 US disclosed
US-20130149544-A1 METHODS OF MATERIAL HYDROPHILIZATION BY SILOXANES CONTAINING NITRILOPOLY (METHYLENEPHOSPHONIC ACID) OR DERIVATIVES THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-06-13 US disclosed