SCHEMBL1503265

SCHEMBL1503265

CCN(CCC[Si](OC)(OC)OC)CCC[Si](OC)(OC)OC

nearest known ligand 0.39

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.39
ALDH1A1 P00352 1/20 0.34
CHRM2 P08172 1/20 0.33
HTR1A P08908 1/20 0.33
ADRA2A P08913 1/20 0.33
CHRM1 P11229 1/20 0.33
DRD1 P21728 1/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
ADRA1A P35348 1/20 0.33
OPRM1 P35372 1/20 0.33
DRD3 P35462 1/20 0.33
SLC6A3 Q01959 1/20 0.33
KCNH2 Q12809 1/20 0.33
BCHE P06276 1/20 0.30
ACHE P22303 1/20 0.30
USP2 O75604 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27074659 0.96 LMNA (0.37) LMNAALDH1A1CHRM2HTR1AADRA2A
SCHEMBL302546 0.95 LMNA (0.39) LMNAALDH1A1CHRM2USP2
Hydrochloric Acid SCHEMBL29264549 0.93 LMNA (0.38) LMNAALDH1A1CHRM2USP2
SCHEMBL26996545 0.92 LMNA (0.35) LMNAALDH1A1USP2
SCHEMBL30547296 0.91 LMNA (0.37) LMNAALDH1A1CHRM2USP2
SCHEMBL16813443 0.91 LMNA (0.37) LMNAALDH1A1CHRM2USP2
SCHEMBL17710288 0.91 LMNA (0.37) LMNAALDH1A1CHRM2USP2
SCHEMBL16813643 0.90 LMNA (0.38) LMNAALDH1A1
SCHEMBL28901070 0.90 LMNA (0.34) LMNAALDH1A1
SCHEMBL380438 0.88 ALDH1A1 (0.41) LMNAALDH1A1CHRM2BCHEACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100047539-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-02-25 US claimed
EP-3950724-B1 CONJUGATED DIENE COPOLYMER AND METHOD FOR MANUFACTURING CONJUGATED DIENE COPOLYMER ZEON CORP (JP) 2026-02-18 EP disclosed
US-12139572-B2 Conjugated diene copolymer and method for manufacturing conjugated diene copolymer ZS ELASTOMERS CO., LTD. (JP) 2024-11-12 US disclosed
EP-3604365-B1 CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING CONJUGATED DIENE POLYMER SUMITOMO CHEMICAL CO (JP) 2024-04-24 EP disclosed
CN-113748134-B Conjugated diene copolymer and method for producing conjugated diene copolymer 瑞住合成橡胶株式会社 2024-03-08 CN disclosed
US-11873415-B2 Substrate with water repellent oil repellent layer, vapor deposition material, and method for producing substrate with water repellent oil repellent layer AGC Inc. (JP) 2024-01-16 US disclosed
CN-110461893-B Conjugated diene polymer and method for producing conjugated diene polymer 住友化学株式会社 2023-10-27 CN disclosed
US-20230220236-A1 COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS AGC Inc. (JP) 2023-07-13 US disclosed
US-11643571-B2 Composition for forming water repellent film, water repellent film, substrate with water repellent film, and article AGC Inc. (JP) 2023-05-09 US disclosed
EP-3495394-B1 METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING POLYMER COMPOSITION SUMITOMO CHEMICAL CO (JP) 2023-04-12 EP disclosed
US-20150031791-A1 Rubber Composition for Tire Treads THE YOKOHAMA RUBBER CO., LTD. (JP) 2015-01-29 US disclosed
US-20130338255-A1 RUBBER COMPOSITION FOR TIRE TREAD THE YOKOHAMA RUBBER CO., LTD. (JP) 2013-12-19 US disclosed
US-20130324638-A1 RUBBER COMPOSITION FOR USE IN TIRE TREADS THE YOKOHAMA RUBBER CO., LTD. (JP) 2013-12-05 US disclosed
US-20130267646-A1 RUBBER COMPOSITION FOR TIRE TREAD AND PNEUMATIC TIRE USING THE SAME THE YOKOHAMA RUBBER CO., LTD. (JP) 2013-10-10 US disclosed
EP-2003146-B1 USE OF A CONJUGATED DIENE RUBBER FOR A TIRE ZEON CORP (JP) 2012-12-26 EP disclosed
US-20110053081-A1 Positive Type Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20110053080-A1 Positive Typed Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20100047539-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-02-25 US disclosed
EP-2003146-A9 CONJUGATED DIENE RUBBER, METHOD FOR PRODUCING THE SAME, RUBBER COMPOSITION FOR TIRE, AND TIRE ZEON CORPORATION (JP) 2009-05-06 EP disclosed
EP-2003146-A2 CONJUGATED DIENE RUBBER, METHOD FOR PRODUCING THE SAME, RUBBER COMPOSITION FOR TIRE, AND TIRE ZEON CORPORATION (JP) 2008-12-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230220236-A1 COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS ZRANB2, ITGB1, ITGB2 LMNA 219/4885ALDH1A1 1997/4885CHRM2 48/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.