SCHEMBL15033459

SCHEMBL15033459

C=C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)CCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12245429 0.98
SCHEMBL12374574 0.88
SCHEMBL15977948 0.86 ALDH1A1 (0.30)
SCHEMBL14981946 0.86
SCHEMBL17878198 0.84
SCHEMBL1002360 0.83 TSHR (0.32)
SCHEMBL16438102 0.83
SCHEMBL19702948 0.81
SCHEMBL14179645 0.80
SCHEMBL19863492 0.79 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9944823-B2 Electrical insulation enamels composed of modified polymers and electrical conductors produced therefrom and having improved sliding capacity SCHWERING & HASSE ELEKTRODRAHT GMBH (DE) 2018-04-17 US disclosed
US-9938432-B2 Polysiloxanes as anti-adhesive and dirt-repellant additives, method for the production and use thereof BYK Chemie, GmbH (DE) 2018-04-10 US disclosed
US-20170247572-A1 POLYSILOXANES AS ANTI-ADHESIVE AND DIRT-REPELLANT ADDITIVES, METHOD FOR THE PRODUCTION AND USE THEREOF BYK-CHEMIE GMBH (DE) 2017-08-31 US disclosed
US-20170204239-A1 POLYDIMETHYLSILOXANE GRAFTED POLYETHYLENE FOAM DOW CHEMICAL(CHINA) INVESTMENT COMPANY LIMITED (CN) 2017-07-20 US disclosed
US-9671667-B2 Electrophoretic particle, electrophoretic particle dispersion liquid, display medium, and display device E INK CORPORATION (US) 2017-06-06 US disclosed
US-20150277205-A1 WHITE PARTICLES FOR DISPLAY, PARTICLE DISPERSION FOR DISPLAY, AND DISPLAY DEVICE FUJI XEROX CO., LTD. (JP) 2015-10-01 US disclosed
US-9030729-B2 Particles for display, particle dispersion for display, display medium, and display device FUJI XEROX CO., LTD. (JP) 2015-05-12 US disclosed
US-20140240815-A1 PARTICLES FOR DISPLAY, PARTICLE DISPERSION FOR DISPLAY, DISPLAY MEDIUM, AND DISPLAY DEVICE FUJI XEROX CO., LTD. (JP) 2014-08-28 US disclosed
US-20140240814-A1 ELECTROPHORETIC PARTICLE, ELECTROPHORETIC PARTICLE DISPERSION LIQUID, DISPLAY MEDIUM, AND DISPLAY DEVICE FUJI XEROX CO., LTD. (JP) 2014-08-28 US disclosed
US-20130153261-A1 Electrical Insulation Enamels Composed of Modified Polymers and Electrical Conductors Produced Therefrom and Having Improved Sliding Capacity SCHWERING & HASSE ELEKTRODRAHT GMBH (DE) 2013-06-20 US disclosed