SCHEMBL15044037

SCHEMBL15044037

CCCC(O)CC(O)CO

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.43
USP2 O75604 3/20 0.43
CYP3A4 P08684 2/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
LMNA P02545 6/20 0.42
ALDH1A1 P00352 2/20 0.42
THRB P10828 1/20 0.41
FDPS P14324 1/20 0.35
TDP1 Q9NUW8 1/20 0.33
CYP2D6 P10635 2/20 0.32
KDM4E B2RXH2 2/20 0.32
SPHK1 Q9NYA1 1/20 0.32
GMNN O75496 1/20 0.32
POLB P06746 1/20 0.32
THPO P40225 1/20 0.32
MTOR P42345 1/20 0.32
BLM P54132 1/20 0.32
TP53 P04637 1/20 0.32
CYP1A2 P05177 1/20 0.32
MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17831990 1.00 TSHR (0.43) TSHRUSP2CYP3A4SMN1; SMN2LMNA
SCHEMBL12653403 0.97 USP2 (0.42) TSHRUSP2CYP3A4SMN1; SMN2LMNA
SCHEMBL3096192 0.88 TSHR (0.38) TSHRUSP2CYP3A4SMN1; SMN2LMNA
SCHEMBL16153750 0.88 TSHR (0.38) TSHRUSP2CYP3A4SMN1; SMN2LMNA
SCHEMBL3096199 0.88 TSHR (0.38) TSHRUSP2CYP3A4SMN1; SMN2LMNA
SCHEMBL28576046 0.88 TSHR (0.38) TSHRUSP2CYP3A4SMN1; SMN2LMNA
SCHEMBL2381476 0.85
SCHEMBL29157267 0.85 THRB (0.56) TSHRUSP2CYP3A4LMNAALDH1A1
SCHEMBL2382234 0.85
SCHEMBL62155 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4621488-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME Ycchem Co., Ltd. (KR) 2025-09-24 EP claimed
US-20250236813-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME YCCHEM CO., LTD. (KR) 2025-07-24 US claimed
CN-120019333-A Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same YC化学制品株式会社 2025-05-16 CN claimed
WO-2024106711-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME 와이씨켐 주식회사 2024-05-23 WO claimed
US-20230266672-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-08-24 US claimed
EP-4212958-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME Young Chang Chemical Co., Ltd. (KR) 2023-07-19 EP claimed
CN-116097398-A Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same 荣昌化学制品株式会社 2023-05-09 CN claimed
US-20220342313-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2022-10-27 US claimed
EP-4036648-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME Young Chang Chemical Co., Ltd. (KR) 2022-08-03 EP claimed
CN-114450640-A Process liquid composition for lithography and pattern formation method using the same 荣昌化学制品株式会社 2022-05-06 CN claimed
WO-2022055128-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME 영창케미칼 주식회사 2022-03-17 WO claimed
CN-113956378-A Polybutene derivative for rubber kneading and rubber composition containing the same DL化学株式会社 2022-01-21 CN claimed
WO-2021060672-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME 영창케미칼 주식회사 2021-04-01 WO claimed
EP-4621488-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME Ycchem Co., Ltd. (KR) 2025-09-24 EP disclosed
US-20250236813-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME YCCHEM CO., LTD. (KR) 2025-07-24 US disclosed
US-20250206939-A1 CURABLE SULFONATED POLYMER COMPOSITIONS NOTARK CORPORATION (US) 2025-06-26 US disclosed
US-20140107350-A1 Process for Preparing Episulfide Compounds ASAHI KASEI CHEMICALS CORPORATION (JP) 2014-04-17 US disclosed
EP-2700636-A1 PROCESS FOR PREPARING EPISULFIDE COMPOUNDS Asahi Kasei Chemicals Corporation (JP) 2014-02-26 EP disclosed
WO-2013118855-A1 HETEROCYCLIC RING AND CARBOCYCLIC DERIVATIVE 塩野義製薬株式会社 (JP) 2013-08-15 WO disclosed
WO-2013089212-A1 SUBSTITUTED TRIAZINE DERIVATIVE AND PHARMACEUTICAL COMPOSITION CONTAINING SAME 塩野義製薬株式会社 (JP) 2013-06-20 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140107350-A1 Process for Preparing Episulfide Compounds TST, EPHX2, STS TSHR 1233/4885USP2 1385/4885CYP3A4 128/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.