SCHEMBL15052279

SCHEMBL15052279

CCN(CC)CCCCN(CC)CC.CCN(CC)CCCCN(CC)CC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.48
HRH4 Q9H3N8 2/20 0.41
HRH3 Q9Y5N1 2/20 0.41
SLC2A1 P11166 1/20 0.41
KCNH2 Q12809 3/20 0.40
ALDH1A1 P00352 2/20 0.40
CHRM2 P08172 1/20 0.40
HTR1A P08908 1/20 0.40
ADRA2A P08913 1/20 0.40
CHRM1 P11229 1/20 0.40
DRD1 P21728 1/20 0.40
SLC6A2 P23975 1/20 0.40
SLC6A4 P31645 1/20 0.40
ADRA1A P35348 1/20 0.40
OPRM1 P35372 1/20 0.40
DRD3 P35462 1/20 0.40
SLC6A3 Q01959 1/20 0.40
NPSR1 Q6W5P4 1/20 0.39
PAOX Q6QHF9 1/20 0.38
MEN1 O00255 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL234338 1.00 SIGMAR1 (0.48) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL2564528 0.96 SIGMAR1 (0.46) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL2142541 0.96 SIGMAR1 (0.46) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL2137948 0.96 SIGMAR1 (0.46) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL2141035 0.96 SIGMAR1 (0.46) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL757610 0.96 SIGMAR1 (0.46) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL6366393 0.96 SIGMAR1 (0.46) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL1313942 0.96 SIGMAR1 (0.46) SIGMAR1HRH4HRH3SLC2A1KCNH2
SCHEMBL757439 0.93 SIGMAR1 (0.44) SIGMAR1HRH4HRH3KCNH2ALDH1A1
SCHEMBL5990364 0.93 SIGMAR1 (0.44) SIGMAR1HRH4HRH3KCNH2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130164694-A1 RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-06-27 US disclosed