Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15282329 | 0.89 | MAPK1 (0.43) | THRBKDM4EMAPK1TDP1MEN1 | |
| SCHEMBL9808175 | 0.89 | TP53 (0.38) | KDM4ETDP1MEN1KMT2A | |
| SCHEMBL419321 | 0.87 | MAPK1 (0.44) | THRBKDM4EMAPK1TDP1MEN1 | |
| SCHEMBL419937 | 0.85 | THRB (0.41) | THRBKDM4EMAPK1TDP1 | |
| SCHEMBL11787432 | 0.85 | TP53 (0.41) | KDM4EMAPK1TDP1MEN1KMT2A | |
| SCHEMBL3426128 | 0.83 | MAPK1 (0.43) | THRBKDM4EMAPK1TDP1MEN1 | |
| SCHEMBL26322259 | 0.82 | PRSS1 (0.42) | THRBKDM4EMAPK1TDP1MEN1 | |
| SCHEMBL26322279 | 0.80 | THRB (0.30) | THRB | |
| SCHEMBL1506385 | 0.79 | CYP3A4 (0.41) | THRB | |
| SCHEMBL1506206 | 0.79 | LTA4H (0.44) | THRBMAPK1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116209699-A | Polyacetal-based releasable compositions | 德路工业胶粘剂有限两合公司 | 2023-06-02 | — | — | CN | claimed |
| EP-2524947-B1 | ORGANIC PASSIVATION LAYER COMPOSITION, TRANSISTOR AND/OR ELECTRONIC DEVICE INCLUDING ORGANIC PASSIVATION LAYER FABRICATED THEREFROM | SAMSUNG ELECTRONICS CO LTD (KR) | 2017-07-12 | — | — | EP | claimed |
| US-9023980-B2 | Organic passivation layer composition, transistor and/or electronic device including organic passivation layer fabricated therefrom | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-05-05 | — | — | US | claimed |
| EP-2575188-B1 | Organic insulator composition including a hydroxyl group-containing polymer, dielectric film and organic thin film transistor using the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2014-05-21 | — | — | EP | claimed |
| EP-2575188-A2 | Organic insulator composition including a hydroxyl group-containing polymer, dielectric film and organic thin film transistor using the same | Samsung Electronics Co., Ltd (KR) | 2013-04-03 | — | — | EP | claimed |
| US-20120291857-A1 | Organic Passivation Layer Composition, Transistor And/Or Electronic Device Including Organic Passivation Layer Fabricated Therefrom | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-11-22 | — | — | US | claimed |
| EP-2524947-A1 | Organic passivation layer composition, transistor and/or electronic device including organic passivation layer fabricated therefrom | Samsung Electronics Co., Ltd. (KR) | 2012-11-21 | — | — | EP | claimed |
| US-8003729-B2 | comprising crosslinkable polyvinylalcohol, polyvinylphenol, polyhydroxyphenylmaleimide, aromatic polyimides and crosslinking agent; resist to heat and chemical; organic thin film transistor | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-08-23 | — | — | US | claimed |
| EP-1995799-A2 | Organic insulator composition including a hydroxyl group-containing polymer, dielectric film and organic thin film transistor using the same | Samsung Electronics Co., Ltd. (KR) | 2008-11-26 | — | — | EP | claimed |
| US-20080283829-A1 | Organic insulator composition including a hydroxyl group-containing polymer, dielectric film and organic thin film transistor using the same | SAMSUNG ELECTRONICS CO., LTD. | 2008-11-20 | — | — | US | claimed |
| US-6395450-B1 | MIXTURE OF ACID GENERATOR, BINDER AND SOLVENT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-05-28 | — | — | US | claimed |
| US-20230350302-A1 | POLYMER CROSSLINK DE-CROSSLINK PROCESSES FOR RESIST PATTERNING | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-02 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| EP-0131824-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-01-23 | — | — | EP | disclosed |
| US-4304838-A | FILMS FOR PEELABLE DEVELOPMENT | FUJI PHOTO FILM CO., LTD. (JP) | 1981-12-08 | — | — | US | disclosed |
| US-4175964-A | SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |