Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 8/20 | 0.41 |
| ▸ | CES1 | P23141 | 6/20 | 0.39 |
| ▸ | CES2 | O00748 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | PLOD2 | O00469 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | PLOD3 | O60568 | 1/20 | 0.38 |
| ▸ | PLOD1 | Q02809 | 1/20 | 0.38 |
| ▸ | MGAM | O43451 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | SI | P14410 | 1/20 | 0.38 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31345778 | 1.00 | FAAH (0.41) | FAAHCES1CES2MEN1KMT2A | |
| Water SCHEMBL27488177 | 0.97 | FAAH (0.39) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL15160 | 0.97 | FAAH (0.42) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL5935545 | 0.94 | FAAH (0.41) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL1537087 | 0.94 | FAAH (0.41) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL31412114 | 0.94 | FAAH (0.41) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL15063312 | 0.94 | FAAH (0.41) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL5929395 | 0.94 | FAAH (0.41) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL14244118 | 0.94 | FAAH (0.41) | FAAHCES1CES2MEN1KMT2A | |
| SCHEMBL945703 | 0.94 | PLOD2 (0.43) | FAAHCES1CES2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114057687-A | Method for preparing pyridyl pyrazolidinone carboxylic acid compounds | 沈阳中化农药化工研发有限公司 | 2022-02-18 | — | — | CN | claimed |
| CN-105418812-A | Supported vanadium alkene polymerization catalyst, preparation method and applications thereof | UNIV EAST CHINA SCIENCE & TECH | 2016-03-23 | — | — | CN | claimed |
| CN-102786910-B | Catalyst composition for silicone sealant, silicone sealant and preparation method for catalyst composition | GUANGDONG OLIVIA CHEMICAL CO LTD | 2013-08-07 | — | — | CN | claimed |
| CN-102786910-A | Catalyst composition for silicone sealant, silicone sealant and preparation method for catalyst composition | GUANGDONG OLIVIA CHEMICAL CO LTD | 2012-11-21 | — | — | CN | claimed |
| CN-1148396-C | Photoeresist composition comprising polycyclic polymers with acid labile pendant groups | ס�ѵ�ľ��ʽ���� | 2004-05-05 | — | — | CN | claimed |
| CN-1104450-C | Homopolymers and copolymers of cationically polymerizable monomers and process for their preparation | GOODRICH CO B F (US) | 2003-04-02 | — | — | CN | claimed |
| CN-119569005-B | Method for improving stability of sulfide electrolyte to lithium in large scale | 浙江大学 | 2025-06-17 | — | — | CN | disclosed |
| CN-119569005-A | Method for improving stability of sulfide electrolyte to lithium in large scale | 浙江大学 | 2025-03-07 | — | — | CN | disclosed |
| CN-114057687-A | Method for preparing pyridyl pyrazolidinone carboxylic acid compounds | 沈阳中化农药化工研发有限公司 | 2022-02-18 | — | — | CN | disclosed |
| CN-109109314-A | For forming the equipment of object and the method for manufacture object by increasing material manufacturing | 通用电气公司 | 2019-01-01 | — | — | CN | disclosed |
| US-20170102613-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2017-04-13 | — | — | US | disclosed |
| US-9575410-B2 | Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2017-02-21 | — | — | US | disclosed |
| CN-105418812-A | Supported vanadium alkene polymerization catalyst, preparation method and applications thereof | UNIV EAST CHINA SCIENCE & TECH | 2016-03-23 | — | — | CN | disclosed |
| CN-102786910-B | Catalyst composition for silicone sealant, silicone sealant and preparation method for catalyst composition | GUANGDONG OLIVIA CHEMICAL CO LTD | 2013-08-07 | — | — | CN | disclosed |
| US-20130168829-A1 | PHENOLIC RESIN COMPOSITION, AND METHODS FOR MANUFACTURING CURED RELIEF PATTERN AND SEMICONDUCTOR | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| CN-103097460-A | Phenolic resin composition, cured relief pattern, and method for producing semiconductor | ASAHI KASEI E MATERIALS CORP | 2013-05-08 | — | — | CN | disclosed |
| CN-102786910-A | Catalyst composition for silicone sealant, silicone sealant and preparation method for catalyst composition | GUANGDONG OLIVIA CHEMICAL CO LTD | 2012-11-21 | — | — | CN | disclosed |
| CN-1148396-C | Photoeresist composition comprising polycyclic polymers with acid labile pendant groups | ס�ѵ�ľ��ʽ���� | 2004-05-05 | — | — | CN | disclosed |
| CN-1104450-C | Homopolymers and copolymers of cationically polymerizable monomers and process for their preparation | GOODRICH CO B F (US) | 2003-04-02 | — | — | CN | disclosed |
| CN-1307603-A | Polycyclic copolymer compositions | GOODRICH CO B F (US) | 2001-08-08 | — | — | CN | disclosed |