Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15065065 | 1.00 | ALDH1A1 (0.37) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL15064567 | 0.88 | ALDH1A1 (0.35) | ALDH1A1TP53CYP3A4SMN1; SMN2 | |
| SCHEMBL15064568 | 0.88 | ALDH1A1 (0.35) | ALDH1A1TP53CYP3A4SMN1; SMN2 | |
| SCHEMBL15064718 | 0.84 | ALDH1A1 (0.35) | ALDH1A1TP53CYP3A4SMN1; SMN2 | |
| SCHEMBL15064719 | 0.84 | ALDH1A1 (0.35) | ALDH1A1TP53CYP3A4SMN1; SMN2 | |
| SCHEMBL15064951 | 0.83 | ALDH1A1 (0.39) | ALDH1A1TP53CYP3A4SMN1; SMN2TSHR | |
| SCHEMBL15064950 | 0.83 | ALDH1A1 (0.39) | ALDH1A1TP53CYP3A4SMN1; SMN2TSHR | |
| SCHEMBL15064890 | 0.79 | ALDH1A1 (0.45) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL10949952 | 0.77 | ALDH1A1 (0.44) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL15064635 | 0.73 | ALDH1A1 (0.39) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2618216-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL CO LTD (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-8836089-B2 | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2618216-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | Hitachi Chemical Co., Ltd. (JP) | 2013-07-24 | — | — | EP | disclosed |
| US-20130168859-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | RESONAC CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |