Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.60 |
| ▸ | MEN1 | O00255 | 4/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | NPC1 | O15118 | 2/20 | 0.45 |
| ▸ | GAA | P10253 | 2/20 | 0.45 |
| ▸ | RAB9A | P51151 | 2/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | CA6 | P23280 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 4/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | EGFR | P00533 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1506778 | 0.87 | PLA2G2D (0.51) | PTPN1MEN1KMT2ANPC1GAA | |
| SCHEMBL9670483 | 0.85 | PTPN1 (0.62) | PTPN1MEN1KMT2ANPC1GAA | |
| SCHEMBL1506785 | 0.81 | MEN1 (0.47) | PTPN1MEN1KMT2ANPC1GAA | |
| SCHEMBL27584579 | 0.79 | HSD17B10 (0.47) | PTPN1MEN1KMT2ANPC1GAA | |
| SCHEMBL28228025 | 0.78 | PTPN1 (0.57) | PTPN1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL27960116 | 0.77 | PTPN1 (0.66) | PTPN1MEN1KMT2ACA12CA1 | |
| SCHEMBL31357157 | 0.77 | PTPN1 (0.70) | PTPN1MEN1KMT2ACA12CA1 | |
| SCHEMBL8105665 | 0.76 | PTPN1 (0.64) | PTPN1MEN1KMT2ACA12CA1 | |
| SCHEMBL186327 | 0.75 | PTPN1 (0.68) | PTPN1MEN1KMT2AGAACA12 | |
| SCHEMBL30365636 | 0.75 | CYP1A2 (0.43) | MEN1KMT2ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-61266429-A | — | — | None | — | — | JP | disclosed |
| US-10429739-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| EP-1739059-B1 | Magnetic recording medium | DOWA ELECTRONICS MATERIALS CO LTD (JP) | 2016-10-26 | — | — | EP | disclosed |
| US-8822588-B2 | Fluorine-containing polymer and anti-static agent wherein same is used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8513457-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-20 | — | — | US | disclosed |
| EP-2289954-B1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | CENTRAL GLASS CO LTD (JP) | 2013-01-16 | — | — | EP | disclosed |
| US-20120226070-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-09-06 | — | — | US | disclosed |
| US-8187787-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-05-29 | — | — | US | disclosed |
| EP-1632459-A1 | Nonmagnetic hematite powder for a magnetic recording medium and method of manufacturing the same | Dowa Mining Co., Ltd. (JP) | 2006-03-08 | — | — | EP | disclosed |
| US-20060040141-A1 | Nonmagnetic powder for a magnetic recording medium, method of manufacturing same, and magnetic recording medium using same | DOWA ELECTRONICS MATERIALS CO., LTD. (JP) | 2006-02-23 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| CN-1117719-A | Readily bondable polyester film | TORAY INDUSTRIES (JP) | 1996-02-28 | — | — | CN | disclosed |
| US-5453349-A | Package of photographic light-sensitive film | KONICA CORPORATION (JP) | 1995-09-26 | — | — | US | disclosed |
| JP-S61266429-A | PRODUCTION OF POLYESTER | DIAFOIL CO LTD | 1986-11-26 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120226070-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | RTF1, FGFR2, FGFR1 | PTPN1 3365/4885MEN1 2055/4885KMT2A 193/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.