Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 7/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | HPGD | P15428 | 4/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | GLA | P06280 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | PKM | P14618 | 2/20 | 0.42 |
| ▸ | EGFR | P00533 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3267828 | 0.84 | MEN1 (0.48) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL1506771 | 0.81 | PTPN1 (0.60) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL890496 | 0.76 | MEN1 (0.61) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL30363668 | 0.76 | MEN1 (0.55) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL7554285 | 0.76 | MEN1 (0.55) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL27829330 | 0.76 | PTPN1 (0.45) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL7542003 | 0.75 | PTPN1 (0.45) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL163552 | 0.74 | MEN1 (0.53) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL29406969 | 0.74 | PTPN1 (0.65) | MEN1KMT2AALDH1A1HPGDHSD17B10 | |
| SCHEMBL1506780 | 0.74 | NQO2 (0.55) | MEN1KMT2AALDH1A1HPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8822588-B2 | Fluorine-containing polymer and anti-static agent wherein same is used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8513457-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-20 | — | — | US | disclosed |
| EP-2289954-B1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | CENTRAL GLASS CO LTD (JP) | 2013-01-16 | — | — | EP | disclosed |
| US-20120226070-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-09-06 | — | — | US | disclosed |
| US-8187787-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20110065857-A1 | Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| EP-2289954-A1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | Central Glass Company, Limited (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120226070-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | RTF1, FGFR2, FGFR1 | MEN1 2055/4885KMT2A 193/4885ALDH1A1 3780/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | MEN1 1618/4885KMT2A 166/4885ALDH1A1 3871/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.