Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | CES1 | P23141 | 6/20 | 0.37 |
| ▸ | CES2 | O00748 | 5/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | SLC22A1 | O15245 | 2/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | LSS | P48449 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217738 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL1925873 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL5575821 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL5993484 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL6561911 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL489856 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL6577114 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL6525154 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL5840662 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL9561970 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026106161-A1 | HIGHLY DISPERSIBLE RADICAL SCAVENGER HAVING LOW LEACHABILITY AND REVERSIBLE REGENERABILITY, AND ELECTROLYTE MEMBRANE INCLUDING SAME | 단국대학교 천안캠퍼스 산학협력단 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026106162-A1 | HIGHLY DISPERSIBLE RADICAL SCAVENGER WITH LOW ELUTION AND REVERSIBLE REGENERABILITY, AND ELECTRODE COMPOSITION COMPRISING SAME | 단국대학교 천안캠퍼스 산학협력단 | 2026-05-21 | — | — | WO | disclosed |
| EP-2298714-B1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FERROELECTRIC THIN FILM FORMATION, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD | MITSUBISHI MATERIALS CORP (JP) | 2017-07-05 | — | — | EP | disclosed |
| US-9502636-B2 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9005358-B2 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |
| US-20140349834-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF | MITSUBISHI MATERIALS CORP (JP) | 2014-11-27 | — | — | US | disclosed |
| US-20140349139-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF | MITSUBISHI MATERIALS CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-8859051-B2 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORPORATION (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8790538-B2 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20130295414-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF | MITSUBISHI MATERIALS CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20110177235-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF | MITSUBISHI MATERIALS CORPORATION (JP) | 2011-07-21 | — | — | US | disclosed |
| EP-2343268-A1 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | Mitsubishi Materials Corporation (JP) | 2011-07-13 | — | — | EP | disclosed |
| US-20110098173-A1 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | STMicroelectronics(Tours) SAS (FR) | 2011-04-28 | — | — | US | disclosed |
| EP-2298714-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FERROELECTRIC THIN FILM FORMATION, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD | Mitsubishi Materials Corporation (JP) | 2011-03-23 | — | — | EP | disclosed |
| US-20060293492-A1 | Process for producing aliphatic polyester, a polyester produced by the process, and an aliphatic polyester | MITSUBISHI CHEMICAL CORPORATION (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1679332-A1 | PROCESS FOR PRODUCING ALIPHATIC POLYESTER AND ALIPHATIC POLYESTER | Mitsubishi Chemical Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-5304533-A | Process for producing an oxide superconductor from alkoxides | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1994-04-19 | — | — | US | disclosed |