Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | CES1 | P23141 | 6/20 | 0.37 |
| ▸ | CES2 | O00748 | 5/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | SLC22A1 | O15245 | 2/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | LSS | P48449 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5575821 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL6561911 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL6577114 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL489856 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL5993484 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL6525154 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL5840662 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL1506925 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL217738 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 | |
| SCHEMBL107743 | 0.92 | TSHR (0.46) | TSHRLMNATHRBCES1CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5271797-A | Method for patterning metal oxide thin film | ROHM CO., LTD. (JP) | 1993-12-21 | — | — | US | claimed |
| US-20240101765-A1 | PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND POLYSILOXANE COPOLYMER, AND PREPARATION METHOD THEREFOR | HUNETPLUS Co.,Ltd. (KR) | 2024-03-28 | — | — | US | disclosed |
| CN-116917378-A | Photosensitive composition comprising organometallic compound and polysiloxane copolymer and method for preparing the same | 胡网加成股份有限公司 | 2023-10-20 | — | — | CN | disclosed |
| EP-4257632-A1 | PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND POLYSILOXANE COPOLYMER, AND PREPARATION METHOD THEREFOR | Hunet Plus Co., Ltd. (KR) | 2023-10-11 | — | — | EP | disclosed |
| US-10947112-B2 | Method of manufacturing semiconductor quantum dot and semiconductor quantum dot | FUJIFILM CORPORATION (JP) | 2021-03-16 | — | — | US | disclosed |
| US-20190027562-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR QUANTUM DOT AND SEMICONDUCTOR QUANTUM DOT | FUJIFILM CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
| US-8722801-B2 | Process for producing hydrolyzable silyl group-containing fluoropolymer, and composition containing hydrolyzable silyl group-containing fluoropolymer | ASAHI GLASS COMPANY, LIMITED (JP) | 2014-05-13 | — | — | US | disclosed |
| EP-1777203-B1 | Ferroelectric capacitor, semiconductor device, and other element | SEIKO EPSON CORP (JP) | 2013-07-17 | — | — | EP | disclosed |
| EP-2524931-A1 | PROCESS FOR PRODUCTION OF FLUOROPOLYMER THAT CONTAINS HYDROLYZABLE SILYL GROUPS, AND COMPOSITION CONTAINING FLUOROPOLYMER THAT CONTAINS HYDROLYZABLE SILYL GROUPS | Asahi Glass Company, Limited (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120220712-A1 | PROCESS FOR PRODUCING HYDROLYZABLE SILYL GROUP-CONTAINING FLUOROPOLYMER, AND COMPOSITION CONTAINING HYDROLYZABLE SILYL GROUP-CONTAINING FLUOROPOLYMER | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-5793600-A | Method for forming high dielectric capacitor electrode structure and semiconductor memory devices | TEXAS INSTRUMENTS INCORPORATED (US) | 1998-08-11 | — | — | US | disclosed |
| US-5776788-A | LEAD-ZIRCONIUM-TITANATE; BY CONTROLLING TEMPERAUTRE, DRYING CONDITIONS | TEXAS INSTRUMENTS INCORPORATED (US) | 1998-07-07 | — | — | US | disclosed |
| US-5508953-A | Capacitor, electrode structure, and semiconductor memory device | TEXAS INSTRUMENTS INCORPORATED (US) | 1996-04-16 | — | — | US | disclosed |
| EP-0653784-A1 | Method for forming a ferroelectric material film by the sol-gel method, along with a process for the production of a capacitor and its raw material solution | TEXAS INSTRUMENTS INCORPORATED (US) | 1995-05-17 | — | — | EP | disclosed |
| EP-0650187-A1 | A method for forming a strong dielectric film by the sol-gel technique and a method for manufacturing a capacitor | TEXAS INSTRUMENTS INCORPORATED (US) | 1995-04-26 | — | — | EP | disclosed |
| US-5271797-A | Method for patterning metal oxide thin film | ROHM CO., LTD. (JP) | 1993-12-21 | — | — | US | disclosed |
| EP-0230515-B1 | METHOD FOR THE PRODUCTION OF A POWDER HAVING A HIGH DIELECTRIC CONSTANT | MITSUBISHI MINING & CEMENT CO., LTD. (JP) | 1991-07-10 | — | — | EP | disclosed |
| US-4744972-A | METAL TITANATE, METAL TUNGSTATE FOR CERAMIC CONDENSERS | MITSUBISHI MINING AND CEMENT CO. LTD. (JP) | 1988-05-17 | — | — | US | disclosed |
| EP-0230515-A1 | Method for the production of a powder having a high dielectric constant | MITSUBISHI MINING & CEMENT CO., LTD. (JP) | 1987-08-05 | — | — | EP | disclosed |
| US-4636248-A | Method for production of dielectric powder | MITSUBISHI MINING & CEMENT CO., LTD. (JP) | 1987-01-13 | — | — | US | disclosed |