Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.61 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.61 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.39 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 5/20 | 0.38 |
| ▸ | CA12 | O43570 | 4/20 | 0.38 |
| ▸ | CA1 | P00915 | 4/20 | 0.38 |
| ▸ | CA2 | P00918 | 4/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.38 |
| ▸ | CA7 | P43166 | 2/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | CA5A | P35218 | 1/20 | 0.38 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.38 |
| ▸ | BCHE | P06276 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6621494 | 0.92 | ALDH1A1 (0.52) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| SCHEMBL1027231 | 0.89 | ALDH1A1 (0.61) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Sulfuric Acid SCHEMBL229799 | 0.88 | KDM4E (0.71) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Sulfuric Acid SCHEMBL7637635 | 0.86 | KDM4E (0.68) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Sulfuric Acid SCHEMBL2243812 | 0.86 | KDM4E (0.68) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| SCHEMBL332134 | 0.86 | KDM4E (0.68) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| SCHEMBL6620666 | 0.85 | KDM4E (0.39) | ALDH1A1KDM4ETDP1CA9CA12 | |
| Thiosulfuric Acid SCHEMBL8424190 | 0.85 | KDM4E (0.65) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| SCHEMBL330944 | 0.85 | KDM4E (0.65) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Sulfuric Acid SCHEMBL229801 | 0.85 | KDM4E (0.65) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8026200-B2 | Low pH mixtures for the removal of high density implanted resist | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-09-27 | — | — | US | claimed |
| EP-2288965-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | Advanced Technology Materials, Inc. (US) | 2011-03-02 | — | — | EP | claimed |
| US-20090281016-A1 | LOW pH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-12 | — | — | US | claimed |
| WO-2009135102-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-05 | — | — | WO | claimed |
| US-8026200-B2 | Low pH mixtures for the removal of high density implanted resist | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-09-27 | — | — | US | disclosed |
| EP-2288965-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | Advanced Technology Materials, Inc. (US) | 2011-03-02 | — | — | EP | disclosed |
| US-20090281016-A1 | LOW pH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-12 | — | — | US | disclosed |
| WO-2009135102-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-05 | — | — | WO | disclosed |
| EP-0985664-B1 | Method of producing pyrrolidine derivatives | TORAY FINECHEMICALS CO LTD (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6479668-B1 | Method of producing pyrrolidine derivatives | TORAY INDUSTRIES, INC. (JP) | 2002-11-12 | — | — | US | disclosed |
| US-6130338-A | OXIDATING THE CORRESPONDING 3-PYRROLINE COMPOUND TO GIVE AN EPOXYPYRROLIDINE COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2000-10-10 | — | — | US | disclosed |
| EP-0985664-A2 | Method of producing pyrrolidine derivatives | TORAY INDUSTRIES, INC. (JP) | 2000-03-15 | — | — | EP | disclosed |