SCHEMBL15082056

SCHEMBL15082056

COc1ccc2c(c1)CCC2OC(=O)C1(C)CC1(C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.46
SRD5A1 P18405 2/20 0.44
LMNA P02545 4/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
MAPT P10636 1/20 0.44
HSD17B1 P14061 1/20 0.44
RECQL P46063 1/20 0.44
HSD17B10 Q99714 1/20 0.43
PPARD Q03181 2/20 0.42
SLC6A9 P48067 1/20 0.41
CYP19A1 P11511 1/20 0.41
MTNR1A P48039 1/20 0.41
MTNR1B P49286 1/20 0.41
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C19 P33261 1/20 0.40
HIF1A Q16665 1/20 0.40
NR3C1 P04150 1/20 0.40
PGR P06401 1/20 0.40
CNR1 P21554 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14838182 0.85 SRD5A1 (0.40) SRD5A1LMNARECQLPPARDCYP3A4
SCHEMBL7123434 0.76 TUBB4A (0.48) SRD5A1PPARDSLC6A9MTNR1AMTNR1B
SCHEMBL5726773 0.74 MTNR1B (0.52) ESR1LMNASMN1; SMN2MAPTPPARD
SCHEMBL15082055 0.74 PPARD (0.42) ESR1SRD5A1PPARDSLC6A9CYP19A1
SCHEMBL2740671 0.74 PPARD (0.44) ESR1SRD5A1PPARDSLC6A9MTNR1A
SCHEMBL2740691 0.74 PPARD (0.44) ESR1SRD5A1PPARDSLC6A9CYP19A1
SCHEMBL6918438 0.74 PPARD (0.44) ESR1SRD5A1PPARDSLC6A9MTNR1A
SCHEMBL3817898 0.74 ESR1 (0.49) ESR1CYP19A1MTNR1AMTNR1BTAS1R3
SCHEMBL3823105 0.74 ESR1 (0.49) ESR1CYP19A1MTNR1AMTNR1BTAS1R3
SCHEMBL10823071 0.74 ESR1 (0.49) ESR1CYP19A1MTNR1AMTNR1BTAS1R3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013100158-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2013-07-04 WO disclosed