Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | GPR119 | Q8TDV5 | 1/20 | 0.31 |
| ▸ | SHBG | P04278 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15152932 | 0.82 | ALDH1A1 (0.33) | MAPTALDH1A1MEN1CYP2D6RAB9A | |
| SCHEMBL6864465 | 0.76 | GPR119 (0.34) | ALDH1A1GPR119KDM4EGAA | |
| SCHEMBL15858521 | 0.75 | — | — | |
| SCHEMBL15203363 | 0.73 | — | — | |
| SCHEMBL18408867 | 0.72 | MAPT (0.40) | MAPTALDH1A1MEN1CYP2D6RAB9A | |
| SCHEMBL14477940 | 0.69 | MAPT (0.32) | MAPTSHBG | |
| SCHEMBL8736716 | 0.69 | GAA (0.41) | MAPTALDH1A1RAB9AGPR119KDM4E | |
| SCHEMBL15521263 | 0.69 | MAPT (0.32) | MAPTSHBG | |
| SCHEMBL32687458 | 0.69 | DPP4 (0.30) | — | |
| SCHEMBL14827402 | 0.69 | GAA (0.37) | RAB9AGPR119KDM4EGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013118851-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-08-15 | — | — | WO | disclosed |
| WO-2013100158-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |