SCHEMBL15083002

SCHEMBL15083002

CC(C)(C)C1(CCOS(=O)(=O)C(F)(F)C(=O)OCC23CC4CC(CC(C4)C2)C3)OCCO1

nearest known ligand 0.35

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.35
▸ MEN1 O00255 3/20 0.34
▸ KMT2A Q03164 3/20 0.34
▸ L3MBTL1 Q9Y468 2/20 0.34
▸ SCN9A Q15858 2/20 0.31
▸ MAPT P10636 1/20 0.31
▸ ATM Q13315 1/20 0.31
▸ CA12 O43570 1/20 0.30
▸ CA1 P00915 1/20 0.30
▸ CA2 P00918 1/20 0.30
▸ CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16263308 0.80 ALDH1A1 (0.39) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL15082944 0.79 SCN9A (0.33) ALDH1A1MEN1KMT2ASCN9A
SCHEMBL26190602 0.76 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL15082954 0.74 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL2247103 0.73 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL593099 0.71 ALDH1A1 (0.45) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
Tert-Butylamine SCHEMBL2245604 0.71 ALDH1A1 (0.43) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
Ammonia Solution, Strong SCHEMBL16105230 0.70 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL16604552 0.70 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL15858317 0.70 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AL3MBTL1SCN9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9223208-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-12-29 — — US disclosed
US-9223208-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-12-29 — — US disclosed
US-20130171562-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-07-04 — — US disclosed
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