SCHEMBL15083644

SCHEMBL15083644

C=C(C)C(=O)OC1CCc2ccsc21

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.33
TAAR1 Q96RJ0 6/20 0.31
KMT2A Q03164 2/20 0.31
HTR1A P08908 1/20 0.31
DRD2 P14416 1/20 0.31
HTR7 P34969 1/20 0.31
ATM Q13315 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10653704 0.80 TAAR1 (0.34) SMN1; SMN2TAAR1KMT2AHTR1ADRD2
SCHEMBL2188983 0.74 IDO1 (0.50) DRD2HTR7
SCHEMBL15850968 0.71 KMT2A (0.31) KMT2AATM
SCHEMBL14297432 0.70 KDM4E (0.59) SMN1; SMN2DRD2
SCHEMBL15182527 0.70 ALDH1A1 (0.34) KMT2AATM
SCHEMBL15083627 0.67 ALDH1A1 (0.34) KMT2AATM
SCHEMBL21483457 0.67 PTGDR (0.38) DRD2HTR7
SCHEMBL21126920 0.66 CHRM4 (0.35) KMT2ADRD2HTR7ATM
SCHEMBL21126488 0.66 KMT2A (0.43) KMT2ADRD2HTR7ATM
SCHEMBL15850922 0.66 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9465291-B2 Radiation-sensitive resin composition, polymer, compound, and method for producing compound JSR CORPORATION (JP) 2016-10-11 US disclosed
US-9465291-B2 Radiation-sensitive resin composition, polymer, compound, and method for producing compound JSR CORPORATION (JP) 2016-10-11 US disclosed
US-20140186771-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2014-07-03 US disclosed
US-20140186771-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2014-07-03 US disclosed
WO-2013099998-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND JSR株式会社 (JP) 2013-07-04 WO disclosed