⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9925266 | 1.00 | — | — | |
| SCHEMBL13178003 | 0.90 | — | — | |
| SCHEMBL10070923 | 0.89 | — | — | |
| SCHEMBL12705194 | 0.89 | — | — | |
| SCHEMBL13206568 | 0.89 | — | — | |
| SCHEMBL17680408 | 0.87 | — | — | |
| SCHEMBL112073 | 0.87 | HMGCR (0.33) | — | |
| SCHEMBL13206571 | 0.87 | — | — | |
| SCHEMBL20171477 | 0.87 | — | — | |
| SCHEMBL19052033 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013099662-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |