SCHEMBL150862

SCHEMBL150862

CCc1cc2ccccc2c(S(=O)(=O)O)c1S(=O)(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.50
GPR84 Q9NQS5 1/20 0.39
ATM Q13315 1/20 0.39
ACP1 P24666 1/20 0.38
NR1I2 O75469 1/20 0.37
ALDH1A1 P00352 4/20 0.37
KDM4E B2RXH2 2/20 0.37
MAPT P10636 2/20 0.37
MPL P40238 2/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2C19 P33261 2/20 0.36
HSD17B10 Q99714 2/20 0.36
CYP2C9 P11712 1/20 0.36
ALOX15 P16050 1/20 0.36
ATIC P31939 1/20 0.36
HIF1A Q16665 1/20 0.36
CTRC Q99895 1/20 0.36
SLC2A1 P11166 2/20 0.35
MEN1 O00255 2/20 0.35
HPGD P15428 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2529080 0.89 GPR84 (0.49) CYP2D6GPR84ATMACP1NR1I2
SCHEMBL9465234 0.88 CYP2D6 (0.51) CYP2D6GPR84ACP1ALDH1A1KDM4E
SCHEMBL2519857 0.87 CYP2D6 (0.48) CYP2D6GPR84ATMACP1NR1I2
SCHEMBL9838417 0.86 CYP2D6 (0.50) CYP2D6GPR84ACP1ALDH1A1KDM4E
SCHEMBL149653 0.86 CYP2D6 (0.44) CYP2D6GPR84ATMMAPTSLC2A1
Ammonia Solution, Strong SCHEMBL23749119 0.85 CYP2D6 (0.47) CYP2D6GPR84ATMACP1NR1I2
SCHEMBL2521799 0.85 MAPT (0.45) CYP2D6GPR84ATMALDH1A1KDM4E
Formaldehyde SCHEMBL10789305 0.84 CYP2D6 (0.46) CYP2D6GPR84ATMACP1NR1I2
SCHEMBL2522842 0.84 MAPT (0.47) CYP2D6GPR84ALDH1A1KDM4EMAPT
SCHEMBL2049326 0.84 MAPT (0.47) CYP2D6GPR84ALDH1A1KDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12415931-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12415930-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12398288-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-08-26 US disclosed
EP-4067437-B1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHINETSU CHEMICAL CO (JP) 2024-08-21 EP disclosed
CN-110016284-B Conductive polymer composition, cover and pattern forming method 信越化学工业株式会社 2023-08-08 CN disclosed
US-20230159766-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
EP-4134388-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-15 EP disclosed
WO-2023013448-A1 INKJET HEAD CLEANING SOLUTION 株式会社ダイセル 2023-02-09 WO disclosed
CN-115397916-A Conductive polymer composition, substrate, and method for producing substrate 信越化学工业株式会社 2022-11-25 CN disclosed
US-20220332957-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-20 US disclosed
US-20070096066-A1 Conductive composition, conductive coating material, conductive resin, capacitor, photoelectric transducer, and their production method SHIN-ETSU POLYMER CO., LTD. (JP) 2007-05-03 US disclosed
US-20070025740-A1 Intermediate transfer belt, production method thereof, and image-forming device using the intermediate transfer belt FUJI XEROX CO., LTD. (JP) 2007-02-01 US disclosed
US-20060202171-A1 Conductive polymer solution, antistatic coating material, antistatic hard coat layer, optical filter, conductive coating film, antistatic tacky adhesive, antistatic tacky adhesive layer, protective material, and method for producing the same SHIN-ETSU POLYMER CO., LTD. (JP) 2006-09-14 US disclosed
CN-1806005-A Conductive composition, conductive coating material, conductive resin, capacitor, photoelectric conversion element, and method for producing same SHINETSU POLYMER CO (JP) 2006-07-19 CN disclosed
US-20060076541-A1 Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof SHIN-ETSU POLYMER CO., LTD. 2006-04-13 US disclosed
US-20060062958-A1 Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof SHIN-ETSU POLYMER CO., LTD (JP) 2006-03-23 US disclosed
EP-1634922-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE COATING MATERIAL, CONDUCTIVE RESIN, CAPACITOR, PHOTO-ELECTRIC CONVERTING ELEMENT, AND PROCESS FOR PRODUCING THE SAME SHIN-ETSU POLYMER CO., LTD. (JP) 2006-03-15 EP disclosed
US-20060047030-A1 Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium SHIN-ETSU POLYMER CO., LTD 2006-03-02 US disclosed
US-20050214554-A1 Polyimide film, image-forming apparatus, method for producing the polyimide film, and method for producing the intermediate transfer belt FUJI XEROX CO., LTD. (JP) 2005-09-29 US disclosed
US-5436796-A Polyaniline in undoped state, second polymer having ester or amide groups, protonic acid NITTO DENKO CORPORATION (JP) 1995-07-25 US disclosed