SCHEMBL1521480

SCHEMBL1521480

C=C[SiH2]CCC(OC)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15208014 0.77
SCHEMBL27868386 0.67
SCHEMBL8003887 0.67
SCHEMBL1807780 0.67
SCHEMBL30140506 0.66 ALDH1A1 (0.36)
SCHEMBL2500675 0.65
SCHEMBL5798618 0.65
SCHEMBL5881349 0.65 TSHR (0.32)
SCHEMBL28717136 0.63
SCHEMBL1474046 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2180312-B1 Method and system for monitoring silane deposition UNITED TECHNOLOGIES CORP (US) 2014-07-30 EP disclosed
US-20110073251-A1 COMPONENT BONDING PREPARATION METHOD UNITED TECHNOLOGIES CORPORATION (US) 2011-03-31 US disclosed
EP-2180312-A2 Plasma etch process sensor United Technologies Corporation (US) 2010-04-28 EP disclosed
US-20100098836-A1 METHOD AND SYSTEM FOR MONITORING SILANE DEPOSITION UNITED TECHNOLOGIES CORPORATION (US) 2010-04-22 US disclosed
US-20100098885-A1 PLASMA SILANIZATION SUPPORT METHOD AND SYSTEM UNITED TECHNOLOGIES CORPORATION (US) 2010-04-22 US disclosed