SCHEMBL1807780

SCHEMBL1807780

COC(CC[SiH2]N)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5050525 0.74
SCHEMBL8003887 0.72
SCHEMBL30140506 0.71 ALDH1A1 (0.36)
SCHEMBL5798618 0.70
SCHEMBL1440096 0.67
SCHEMBL1521480 0.67
Hydrochloric Acid SCHEMBL14876676 0.65
SCHEMBL17435932 0.64
SCHEMBL31256591 0.64
SCHEMBL594532 0.63 ALDH1A1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119371873-A Graphene modified gradient distribution high-temperature-resistant anticorrosive paint and preparation method thereof 浙江大学 2025-01-28 CN claimed
CN-116712531-A Lacrimal gland nursing eye drops and preparation method thereof 深圳市华盛行贸易有限公司 2023-09-08 CN claimed
CN-116410730-A Mixed gas foam fracturing fluid and preparation method thereof 中国石油天然气股份有限公司 2023-07-11 CN claimed
CN-119371873-A Graphene modified gradient distribution high-temperature-resistant anticorrosive paint and preparation method thereof 浙江大学 2025-01-28 CN disclosed
CN-116712531-A Lacrimal gland nursing eye drops and preparation method thereof 深圳市华盛行贸易有限公司 2023-09-08 CN disclosed
CN-116410730-A Mixed gas foam fracturing fluid and preparation method thereof 中国石油天然气股份有限公司 2023-07-11 CN disclosed
CN-116102027-A Preparation method of modified nano silicon dioxide 苏州达米昂科技有限公司 2023-05-12 CN disclosed
EP-2895641-B1 METHODS FOR IMPROVING CONTROL AND EFFICIENCY OF LAYER-BY-LAYER PROCESSES EASTMAN CHEM CO (US) 2020-03-11 EP disclosed
US-9387505-B2 Methods, materials and apparatus for improving control and efficiency of layer-by-layer processes EASTMAN CHEMICAL COMPANY (US) 2016-07-12 US disclosed
US-9376586-B2 Coating agents with good storage stability, and coatings produced therefrom with high scratch resistance and simultaneously good weathering resistance BASF COATINGS GMBH (DE) 2016-06-28 US disclosed
US-20140079884-A1 Methods, Materials and Apparatus for improving control and efficiency of layer-by-layer processes Svaya Nanotechnologies, Inc (US) 2014-03-20 US disclosed
EP-2501496-B1 COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE BASF COATINGS GMBH (DE) 2014-02-12 EP disclosed
US-20130190437-A1 COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE BASF COATINGS GMBH (DE) 2013-07-25 US disclosed
EP-2501496-A1 COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE BASF Coatings GmbH (DE) 2012-09-26 EP disclosed
WO-2011060858-A1 COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE BASF COATINGS GMBH (DE) 2011-05-26 WO disclosed
EP-0592972-A2 Resist coated metal- or semiconductor-substrate having a stable resist-substrate adhesion INSTITUT FÜR MIKROTECHNIK MAINZ GmbH (DE) 1994-04-20 EP disclosed