SCHEMBL15280989

SCHEMBL15280989

C=C(C)C(=O)OCCCC(OC(=O)OC(C)(C)C)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.43
THRB P10828 1/20 0.37
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15280981 0.82 TSHR (0.36) TSHRTHRB
SCHEMBL18317984 0.79 TSHR (0.53) TSHRTHRBPOLBAPEX1HTT
SCHEMBL16167778 0.78 CYP4F2 (0.32)
SCHEMBL17779905 0.77 TSHR (0.40) TSHRTHRBPOLBAPEX1HTT
SCHEMBL28254642 0.77 TSHR (0.55) TSHRTHRBPOLBAPEX1HTT
SCHEMBL2631405 0.77
SCHEMBL12416078 0.76 TSHR (0.50) TSHRTHRBPOLBAPEX1HTT
SCHEMBL10127421 0.76 CES2 (0.34)
SCHEMBL28255973 0.76 TSHR (0.53) TSHRTHRBPOLBAPEX1HTT
SCHEMBL9894747 0.75 THRB (0.53) TSHRTHRBPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8859194-B2 Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-14 US disclosed
US-8859194-B2 Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-14 US disclosed
US-20130252170-A1 Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process DONGJIN SEMICHEM CO., LTD. (KR) 2013-09-26 US disclosed
US-20130252170-A1 Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process DONGJIN SEMICHEM CO., LTD. (KR) 2013-09-26 US disclosed