Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | DNM1 | Q05193 | 8/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15330048 | 0.93 | CHRM2 (0.42) | CHRM2DNM1MEN1KMT2AALDH1A1 | |
| SCHEMBL3684348 | 0.91 | CHRM2 (0.46) | CHRM2DNM1MEN1KMT2AALDH1A1 | |
| SCHEMBL6651787 | 0.84 | — | — | |
| SCHEMBL9640863 | 0.80 | CHRM2 (0.33) | CHRM2DNM1MEN1KMT2AALDH1A1 | |
| SCHEMBL7770556 | 0.79 | DNM1 (0.32) | DNM1ALDH1A1TSHR | |
| SCHEMBL5090997 | 0.78 | CHRM2 (0.32) | CHRM2TSHR | |
| SCHEMBL20197088 | 0.76 | CHRM2 (0.31) | CHRM2 | |
| SCHEMBL18797279 | 0.76 | CYP2C19 (0.48) | MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL825691 | 0.76 | MEN1 (0.46) | CHRM2DNM1MEN1KMT2AALDH1A1 | |
| SCHEMBL7208214 | 0.75 | CHRM2 (0.33) | CHRM2DNM1MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250343042-A1 | DIFFUSING AGENT COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| WO-2023238799-A1 | DIFFUSING AGENT COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | 東京応化工業株式会社 | 2023-12-14 | — | — | WO | disclosed |
| US-11773287-B2 | Method for forming coating | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230011185-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-12 | — | — | US | disclosed |
| CN-115315783-A | Laminate, method for producing laminate, and method for producing semiconductor substrate | 东京应化工业株式会社 | 2022-11-08 | — | — | CN | disclosed |
| US-11120993-B2 | Diffusing agent composition and method of manufacturing semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-09-14 | — | — | US | disclosed |
| US-20200373162-A1 | DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-26 | — | — | US | disclosed |
| US-20200369914-A1 | METHOD FOR FORMING COATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-26 | — | — | US | disclosed |
| EP-2841537-A1 | USE OF ADDITIVES WITH DETERGENT ACTION FOR FURTHER INCREASING THE CETANE NUMBER OF FUEL OILS | BASF SE (DE) | 2015-03-04 | — | — | EP | disclosed |
| WO-2013160294-A1 | USE OF ADDITIVES WITH DETERGENT ACTION FOR FURTHER INCREASING THE CETANE NUMBER OF FUEL OILS | BASF SE (DE) | 2013-10-31 | — | — | WO | disclosed |
| US-20130276362-A1 | USE OF ADDITIVES WITH DETERGENT ACTION FOR FURTHER INCREASING THE CETANE NUMBER OF FUEL OILS | BASF SE (DE) | 2013-10-24 | — | — | US | disclosed |