SCHEMBL1532967

SCHEMBL1532967

CCC(c1ccccc1OC)[Si](Cl)(Cl)Cl

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.43
CA2 P00918 4/20 0.43
CA7 P43166 2/20 0.43
CA9 Q16790 2/20 0.43
CA12 O43570 1/20 0.43
CA4 P22748 1/20 0.43
CA14 Q9ULX7 1/20 0.43
POLB P06746 1/20 0.39
HTT P42858 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
IDO1 P14902 1/20 0.39
TDO2 P48775 1/20 0.39
TDP1 Q9NUW8 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ALDH1A1 P00352 3/20 0.37
GAA P10253 1/20 0.37
MAPT P10636 1/20 0.37
ACHE P22303 2/20 0.37
TP53 P04637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22555403 0.84 TSHR (0.31) ALDH1A1TSHR
SCHEMBL7916958 0.82 PKM (0.30)
SCHEMBL3345346 0.81 CA1 (0.43) CA1CA2CA7CA9CA12
SCHEMBL11338495 0.75 CA1 (0.48) CA1CA2CA7CA9CA12
SCHEMBL28330769 0.75 CA1 (0.48) CA1CA2CA7CA9CA12
SCHEMBL12157085 0.74 HTT (0.53) CA1CA2CA7CA9CA12
SCHEMBL11750476 0.74 IDO1 (0.53) CA1CA2CA7CA9CA12
SCHEMBL19355318 0.72 TSHR (0.57) CA1CA2CA7CA9CA12
Ammonia Solution, Strong SCHEMBL6001135 0.72 IDO1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL29657286 0.72 TSHR (0.57) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8309181-B2 Method of manufacturing polymer film FUJIFILM CORPORATION (JP) 2012-11-13 US disclosed
US-20110052821-A1 METHOD OF MANUFACTURING POLYMER FILM FUJIFILM CORPORATION (JP) 2011-03-03 US disclosed
US-20100151188-A1 STRUCTURE HAVING ORGANIC-INORGANIC COMPOSITE LAYER AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2010-06-17 US disclosed
US-5612170-A SILICONE, PHOTO ACID GENERATOR, DISSOLUTION INHIBITOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-03-18 US disclosed