SCHEMBL28330769

SCHEMBL28330769

COc1ccccc1C(C)[Si](Cl)(Cl)Cl

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.48
CA2 P00918 4/20 0.48
CA7 P43166 2/20 0.48
CA9 Q16790 2/20 0.48
CA12 O43570 1/20 0.48
CA4 P22748 1/20 0.48
CA14 Q9ULX7 1/20 0.48
ACHE P22303 1/20 0.43
IDO1 P14902 1/20 0.42
TDO2 P48775 1/20 0.42
ALDH1A1 P00352 3/20 0.40
TP53 P04637 1/20 0.40
TSHR P16473 1/20 0.40
ADRA2B P18089 1/20 0.40
PTGS1 P23219 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
KMT2A Q03164 1/20 0.39
HTT P42858 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
MAPK1 P28482 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8713730 0.82 GABRA1 (0.39) CA1CA2ALDH1A1TSHRPTGS1
SCHEMBL7920316 0.80 ALDH1A1 (0.31) ALDH1A1
SCHEMBL28330763 0.79 CA1 (0.48) CA1CA2CA7CA9CA12
SCHEMBL26249062 0.78 CA1 (0.46) CA1CA2CA7CA9CA12
SCHEMBL11744083 0.76 CA1 (0.55) CA1CA2CA7CA9CA12
SCHEMBL31257131 0.75 CA1 (0.60) CA1CA2CA7CA9CA12
SCHEMBL9303081 0.75 CA1 (0.60) CA1CA2CA7CA9CA12
SCHEMBL141647 0.75 CA1 (0.60) CA1CA2CA7CA9CA12
SCHEMBL1532967 0.75 CA1 (0.43) CA1CA2CA7CA9CA12
SCHEMBL840826 0.74 ESR1 (0.46) ACHEALDH1A1TP53TSHRADRA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115362216-B Composition for forming film 日产化学株式会社 2024-07-19 CN disclosed
CN-118159910-A Additive-containing silicon-containing resist underlayer film forming composition 日产化学株式会社 2024-06-07 CN disclosed
CN-113518762-B Release layer dispersion of layered compound and transparent substrate using the same 公立大学法人大阪 2024-05-28 CN disclosed
CN-117716295-A Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film 日产化学株式会社 2024-03-15 CN disclosed
CN-117460995-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-26 CN disclosed
CN-117396811-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-12 CN disclosed
CN-117255971-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-12-19 CN disclosed
CN-106462075-B Composition for forming resist underlayer film containing silicon having phenyl chromophore 日产化学工业株式会社 2019-12-06 CN disclosed