SCHEMBL15418802

SCHEMBL15418802

c1ccc(-c2ccc(Sc3ccc(Sc4ccccc4-c4ccc(-c5ccccc5)cc4)cc3)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 3/20 0.43
KDM4E B2RXH2 1/20 0.43
NSD2 O96028 1/20 0.43
MAPT P10636 1/20 0.43
HTR7 P34969 1/20 0.42
MMP2 P08253 2/20 0.39
MMP9 P14780 2/20 0.39
MMP12 P39900 2/20 0.39
ALDH1A1 P00352 5/20 0.38
HSD17B10 Q99714 3/20 0.37
HPGD P15428 1/20 0.37
BCL2L1 Q07817 1/20 0.37
CYP2A6 P11509 1/20 0.37
MAOA P21397 1/20 0.36
MAOB P27338 1/20 0.36
SIRT1 Q96EB6 1/20 0.36
DRD1 P21728 1/20 0.36
MCL1 Q07820 1/20 0.36
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27880556 0.96 MAPK1 (0.46) MAPK1KDM4ENSD2MAPTHTR7
SCHEMBL9568786 0.94 MAPT (0.48) MAPK1KDM4ENSD2MAPTHTR7
SCHEMBL17065474 0.94 MAPT (0.48) MAPK1KDM4ENSD2MAPTHTR7
SCHEMBL10706537 0.94 MAPT (0.48) MAPK1KDM4ENSD2MAPTHTR7
SCHEMBL7737500 0.94 MAPK1 (0.48) MAPK1KDM4ENSD2MAPTHTR7
SCHEMBL3282692 0.89 MAPT (0.44) MAPK1KDM4ENSD2MAPTHTR7
SCHEMBL6550775 0.89 MAPT (0.52) MAPK1KDM4ENSD2MAPTHTR7
Hydrogen Sulfide SCHEMBL27169707 0.87 MAPT (0.50) MAPK1KDM4ENSD2MAPTHTR7
SCHEMBL29546908 0.87 ALDH1A1 (0.45) MAPK1MAPTALDH1A1HSD17B10HPGD
SCHEMBL15418803 0.87 ALDH1A1 (0.45) MAPK1MAPTALDH1A1HSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2399905-B1 SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION SAN APRO LTD (JP) 2014-01-22 EP claimed
EP-3312211-B1 CURABLE COMPOSITION, ADHESIVE SHEET, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING ADHESIVE SHEET, AND DEVICE DAICEL CORP (JP) 2026-05-27 EP disclosed
EP-4624507-A1 EPOXY GROUP-CONTAINING CYCLIC ORGANOPOLYSILOXANE, CURABLE COMPOSITION COMPRISING SAME, AND CURED PRODUCT THEREOF SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-01 EP disclosed
EP-3626795-B1 CURABLE COMPOSITION FOR ADHESIVE AGENTS, ADHESIVE SHEET, CURED ARTICLE, LAMINATE, AND DEVICE DAICEL CORP (JP) 2024-10-02 EP disclosed
US-12091588-B2 Curable composition for adhesive agents, adhesive sheet, cured article, laminate, and device DAICEL CORPORATION (JP) 2024-09-17 US disclosed
WO-2024111283-A1 EPOXY GROUP-CONTAINING CYCLIC ORGANOPOLYSILOXANE, CURABLE COMPOSITION COMPRISING SAME, AND CURED PRODUCT THEREOF 信越化学工業株式会社 2024-05-30 WO disclosed
EP-3738739-B1 CURABLE COMPOSITION AND CURED PRODUCT FROM SAME DAICEL CORP (JP) 2023-03-08 EP disclosed
EP-3603922-B1 SILICONE MOLD DAICEL CORP (JP) 2022-06-15 EP disclosed
US-20210189080-A1 COMPOSITION FOR FORMING HARD COAT, METHOD FOR PRODUCING ARTICLE HAVING HARD COAT, HARD COAT, HARD-COATED ARTICLE, AND SILANE-MODIFIED ALICYCLIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-24 US disclosed
EP-3336122-B1 CURABLE COMPOSITION AND CURED PRODUCT FROM SAME DAICEL CORP (JP) 2021-06-02 EP disclosed
EP-3738739-A1 CURABLE COMPOSITION AND CURED PRODUCT FROM SAME Daicel Corporation (JP) 2020-11-18 EP disclosed
EP-3336122-A1 CURABLE COMPOSITION AND CURED PRODUCT FROM SAME Daicel Corporation (JP) 2018-06-20 EP disclosed