Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.52 |
| ▸ | NSD2 | O96028 | 1/20 | 0.52 |
| ▸ | HTR7 | P34969 | 1/20 | 0.46 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.41 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.41 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.39 |
| ▸ | TUBB | P07437 | 1/20 | 0.39 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.39 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.39 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.39 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.39 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.39 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL27169707 | 0.98 | MAPT (0.50) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL7737500 | 0.96 | MAPK1 (0.48) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL27880556 | 0.93 | MAPK1 (0.46) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL17065474 | 0.91 | MAPT (0.48) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL17292795 | 0.91 | MAPK1 (0.48) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL9568786 | 0.91 | MAPT (0.48) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL10706537 | 0.91 | MAPT (0.48) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL15418802 | 0.89 | MAPK1 (0.43) | MAPTMAPK1KDM4ENSD2HTR7 | |
| Hydrogen Sulfide SCHEMBL28028821 | 0.89 | MAPK1 (0.47) | MAPTMAPK1KDM4ENSD2HTR7 | |
| SCHEMBL17847463 | 0.88 | MAPT (0.47) | MAPTMAPK1KDM4ENSD2HTR7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119439633-A | Method of predicting EUV dose, method of designing photoacid generator, and method of manufacturing semiconductor device | 三星电子株式会社 | 2025-02-14 | — | — | CN | disclosed |
| US-20250044706-A1 | METHOD OF PREDICTING EUV DOSE, METHOD OF DESIGNING PAG USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-02-06 | — | — | US | disclosed |
| CN-118271216-A | Synthesis method of 2,2' -dithio (seleno) biaryl derivative | 中南大学 | 2024-07-02 | — | — | CN | disclosed |
| WO-2022030139-A1 | PHOTOACID GENERATOR | サンアプロ株式会社 | 2022-02-10 | — | — | WO | disclosed |
| US-10551738-B2 | Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2020-02-04 | — | — | US | disclosed |
| US-20190179227-A1 | PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MANUFACTURING PATTERNED DEVICES AND SEMICONDUCTOR DEVICES | SAMSUNG ELECTRONICS CO LTD (KR) | 2019-06-13 | — | — | US | disclosed |
| US-10234760-B2 | Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-03-19 | — | — | US | disclosed |
| US-20170168389-A1 | PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MANUFACTURING PATTERNED DEVICES AND SEMICONDUCTOR DEVICES | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-06-15 | — | — | US | disclosed |
| US-20170168389-A1 | PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MANUFACTURING PATTERNED DEVICES AND SEMICONDUCTOR DEVICES | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-06-15 | — | — | US | disclosed |
| US-9551933-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| EP-0904592-B1 | MAGNETORHEOLOGICAL FLUID | LORD CORP (US) | 2004-12-01 | — | — | EP | disclosed |
| US-6103445-A | POLYMER OF A T-BUTYL ESTER OF NORBORNENE CARBOXYLIC ACID ANALOG, A PHOTOACID GENERATOR, AND PLASTICIZER COMPRISING A DI-TERT-BUTYL ESTER OF A POLYCYCLIC DICARBOXYLIC ACID; TRANSPARENCY AT 193 NM AND AN ETCH RESISTANCE; RESOLUTION | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2000-08-15 | — | — | US | disclosed |
| EP-0904592-A1 | MAGNETORHEOLOGICAL FLUID | LORD CORPORATION (US) | 1999-03-31 | — | — | EP | disclosed |
| WO-1997048110-A1 | MAGNETORHEOLOGICAL FLUID | LORD CORPORATION (US) | 1997-12-18 | — | — | WO | disclosed |
| US-5683615-A | Magnetorheological fluid | LORD CORPORATION (US) | 1997-11-04 | — | — | US | disclosed |
| US-5271858-A | Field dependent fluids containing electrically conductive tin oxide coated materials | ENSCI INC. (US) | 1993-12-21 | — | — | US | disclosed |
| EP-0279217-A1 | Process for the preparation of poly(arylensulfides) with adjustable melt viscosity | BAYER AG (DE) | 1988-08-24 | — | — | EP | disclosed |
| US-4082808-A | ANTIOXIDANTS, INTERMEDIATES FOR POLYESTERS, POLYCARBONATES, EPOXY RESINS | GENERAL ELECTRIC COMPANY (US) | 1978-04-04 | — | — | US | disclosed |
| US-3953519-A | BASES, EPOXY COMPOUNDS, OLEFINS | GENERAL ELECTRIC COMPANY (US) | 1976-04-27 | — | — | US | disclosed |
| US-3939084-A | Functional fluid compositions containing substituted pyrimidines | MONSANTO COMPANY (US) | 1976-02-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10234760-B2 | Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices | PARG, PUF60, PFAS | MAPT 448/4885MAPK1 2928/4885KDM4E 2071/4885 |
| US-10551738-B2 | Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices | PARG, PUF60, PFAS | MAPT 448/4885MAPK1 2928/4885KDM4E 2071/4885 |
| US-20190179227-A1 | PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MANUFACTURING PATTERNED DEVICES AND SEMICONDUCTOR DEVICES | PARG, PUF60, PFAS | MAPT 448/4885MAPK1 2928/4885KDM4E 2071/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.