⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL52728 | 1.00 | — | — | |
| Fluoride SCHEMBL1095041 | 1.00 | — | — | |
| Fluoride SCHEMBL1524506 | 1.00 | — | — | |
| Fluoride SCHEMBL63781 | 1.00 | — | — | |
| Fluoride SCHEMBL28260286 | 0.82 | — | — | |
| Fluoride SCHEMBL28055792 | 0.82 | — | — | |
| F-18 SCHEMBL117749 | 0.71 | — | — | |
| Fluoride SCHEMBL9318976 | 0.71 | — | — | |
| Fluoride SCHEMBL38465 | 0.71 | — | — | |
| Fluoride SCHEMBL49263 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 337 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260044065-A1 | METHOD AND DEVICE FOR MASK REPAIR | ZEISS CARL SMT GMBH (DE) | 2026-02-12 | — | — | US | claimed |
| EP-4250005-B1 | METHOD AND APPARATUS FOR MASK REPAIR | ZEISS CARL SMT GMBH (DE) | 2025-06-25 | — | — | EP | claimed |
| US-20240419065-A1 | METHOD AND APPARATUS FOR MASK REPAIR | CARL ZEISS SMT GMBH (DE) | 2024-12-19 | — | — | US | claimed |
| WO-2024218314-A1 | METHOD AND DEVICE FOR MASK REPAIR | CARL ZEISS SMT GMBH (DE) | 2024-10-24 | — | — | WO | claimed |
| US-20230305386-A1 | METHOD AND APPARATUS FOR MASK REPAIR | CARL ZEISS SMT GMBH (DE) | 2023-09-28 | — | — | US | claimed |
| EP-4250005-A1 | METHOD AND APPARATUS FOR MASK REPAIR | Carl Zeiss SMT GmbH (DE) | 2023-09-27 | — | — | EP | claimed |
| CN-116794926-A | Method and apparatus for mask repair | 卡尔蔡司SMT有限责任公司 | 2023-09-22 | — | — | CN | claimed |
| WO-2023165975-A1 | METHOD AND APPARATUS FOR MASK REPAIR | CARL ZEISS SMT GMBH (DE) | 2023-09-07 | — | — | WO | claimed |
| CN-106328580-B | Vapor etching method of copper interconnection structure | 盛美半导体设备(上海)股份有限公司 | 2021-05-14 | — | — | CN | claimed |
| US-10895010-B2 | Solid precursor-based delivery of fluid utilizing controlled solids morphology | ENTEGRIS, INC. (US) | 2021-01-19 | — | — | US | claimed |
| US-20030073302-A1 | Methods for formation of air gap interconnects | REFLECTIVITY, INC., A CALIFORNIA CORPORATION | 2003-04-17 | — | — | US | claimed |
| WO-2003003809-A2 | METHODS OF USING ELECTRON ACTIVE COMPOUNDS FOR MANAGING CONDITIONS AFFLICTING MAMMALS | MARANTECH HOLDING, LLC (US) | 2003-01-16 | — | — | WO | claimed |
| US-20020195423-A1 | Method for vapor phase etching of silicon | REFLECTIVITY, INC. | 2002-12-26 | — | — | US | claimed |
| US-20020121502-A1 | Method for achieving improved selectivity in an etching process | REFLECTIVITY, INC. | 2002-09-05 | — | — | US | claimed |
| WO-2001072275-A1 | OXIDATIVE FLUORINATOR COMPOUNDS AS ANTIMICROBIALS | MARANTECH HOLDING, LLC (US) | 2001-10-04 | — | — | WO | claimed |
| US-6290864-B1 | Fluoride gas etching of silicon with improved selectivity | REFLECTIVITY, INC. | 2001-09-18 | — | — | US | claimed |
| WO-2001030715-A1 | FLUORIDE GAS ETCHING OF SILICON WITH IMPROVED SELECTIVITY | REFLECTIVITY, INC. (US) | 2001-05-03 | — | — | WO | claimed |
| US-5730954-A | Preparation comprising cavitate- or clathrate-forming host/guest complexes as contrast agent | SCHERING AKTIENGESELLSCHAFT (DE) | 1998-03-24 | — | — | US | claimed |
| US-4948478-A | Uranium isotope separation process following the molecular laser process | URANIT GMBH (DE) | 1990-08-14 | — | — | US | claimed |
| US-4001135-A | XENON FLUORIDE, FLUOROPOLYMER | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1977-01-04 | — | — | US | claimed |