Fluoride

Fluoride

SCHEMBL52728

F.[Xe]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL1095041 1.00
Fluoride SCHEMBL1524506 1.00
Fluoride SCHEMBL154236 1.00
Fluoride SCHEMBL63781 1.00
Fluoride SCHEMBL28260286 0.82
Fluoride SCHEMBL28055792 0.82
F-18 SCHEMBL117749 0.71
Fluoride SCHEMBL9318976 0.71
Fluoride SCHEMBL38465 0.71
Fluoride SCHEMBL49263 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2104 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12631666-B2 Controlled creation of sub-50 nm defects in 2D materials at low temperature UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION, INC. (US) 2026-05-19 US claimed
US-12615980-B2 Etching of indium gallium zinc oxide LAM RESEARCH CORPORATION (US) 2026-04-28 US claimed
US-20260061243-A1 HALOGEN DECONTAMINATION FROM METAL-CONTAINING MATERIALS USING CHEMICAL MODIFICATION TOKYO ELECTRON LTD (JP) 2026-03-05 US claimed
EP-4619072-A1 A MICRONEEDLE PRODUCTION METHOD INDEPENDENT OF PHOTOLITHOGRAPHY Bilkent Universitesi Ulusal Nanoteknoloji Arastirma Merkezi (TR) 2025-09-24 EP claimed
EP-4617778-A1 DRY DEVELOPING METHOD AND DRY DEVELOPING DEVICE Tokyo Electron Limited (JP) 2025-09-17 EP claimed
US-20250284198-A1 DRY DEVELOPMENT METHOD AND DRY DEVELOPMENT APPARATUS TOKYO ELECTRON LIMITED (JP) 2025-09-11 US claimed
US-20250172750-A1 CHIPS FOR OPTICAL GYROSCOPES OSCPS MOTION SENSING INC. (CA) 2025-05-29 US claimed
CN-119736658-A Multi-carbon-layer metal atom-loaded material and preparation method thereof 中国科学院城市环境研究所 2025-04-01 CN claimed
US-12255075-B2 Atomic layer etching method using ligand exchange reaction SK Hynix Inc. (KR) 2025-03-18 US claimed
CN-119470599-A HEMT biosensor preparation method and HEMT biosensor 之江实验室 2025-02-18 CN claimed
US-4704469-A Preparation of halogenated phenols FIDIA S.P.A. (IT) 1987-11-03 US claimed
US-4703229-A GAS MIXTURE OF XENON, FLUORINE, AND OTHER INERT GASES UNITED TECHNOLOGIES CORPORATION (US) 1987-10-27 US claimed
EP-0233755-A2 Ultraviolet laser treating of molded surfaces AMOCO CORPORATION (US) 1987-08-26 EP claimed
US-4660210-A Two-halogen donor mixture for XeF (C→A) laser UNITED TECHNOLOGIES CORPORATION (US) 1987-04-21 US claimed
EP-0218540-A2 An optical display from XeF excimer fluorescence UNITED TECHNOLOGIES CORPORATION (US) 1987-04-15 EP claimed
US-4646311-A Multi-component buffer gas mixture for XeF(C→A) laser UNITED TECHNOLOGIES CORPORATION (US) 1987-02-24 US claimed
US-4627066-A Excimer laser pumped by dissociative recombination UNIVERSITY OF IOWA RESEARCH FOUNDATION (US) 1986-12-02 US claimed
US-4606034-A Enhanced laser power output BOARD OF TRUSTEES, UNIVERSITY OF ILLINOIS (US) 1986-08-12 US claimed
EP-0151869-A2 Apparatus for ophthalmological surgery L'Esperance, Francis A. (US) 1985-08-21 EP claimed
US-4001135-A XENON FLUORIDE, FLUOROPOLYMER THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 1977-01-04 US claimed