⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL52728 | 1.00 | — | — | |
| Fluoride SCHEMBL1095041 | 1.00 | — | — | |
| Fluoride SCHEMBL1524506 | 1.00 | — | — | |
| Fluoride SCHEMBL154236 | 1.00 | — | — | |
| Fluoride SCHEMBL28260286 | 0.82 | — | — | |
| Fluoride SCHEMBL28055792 | 0.82 | — | — | |
| F-18 SCHEMBL117749 | 0.71 | — | — | |
| Fluoride SCHEMBL9318976 | 0.71 | — | — | |
| Fluoride SCHEMBL38465 | 0.71 | — | — | |
| Fluoride SCHEMBL49263 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 8672 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116155232-B | Lamb wave resonator and manufacturing method thereof | 中国科学技术大学 | 2026-05-15 | — | — | CN | claimed |
| WO-2026101630-A1 | METHODS OF SELECTIVELY ETCHING SILICON | APPLIED MATERIALS, INC. (US) | 2026-05-15 | — | — | WO | claimed |
| EP-4741946-A1 | METHOD FOR MANUFACTURING SILICON CLOCK COMPONENTS | Richemont International SA (CH) | 2026-05-13 | — | — | EP | claimed |
| EP-3959547-B1 | TRANSFERRING NANOSTRUCTURES FROM WAFERS TO TRANSPARENT SUBSTRATES | APPLIED MATERIALS INC (US) | 2026-05-13 | — | — | EP | claimed |
| US-20260130144-A1 | METHODS OF SELECTIVELY ETCHING SILICON | APPLIED MATERIALS, INC. (US) | 2026-05-07 | — | — | US | claimed |
| US-12613364-B2 | Glass diffraction grating and method of producing the same | NALUX CO., LTD. (JP) | 2026-04-28 | — | — | US | claimed |
| US-20260099096-A1 | BATCH PROCESSING TOOL FOR DRY DEVELOP OF EXTREME ULTRA VIOLET (EUV) RESIST LAYER | APPLIED MATERIALS INC (US) | 2026-04-09 | — | — | US | claimed |
| US-20260098333-A1 | INHIBITED OXIDE DEPOSITION FOR REFILLING SHALLOW TRENCH ISOLATION | LAM RES CORP (US) | 2026-04-09 | — | — | US | claimed |
| US-20260044065-A1 | METHOD AND DEVICE FOR MASK REPAIR | ZEISS CARL SMT GMBH (DE) | 2026-02-12 | — | — | US | claimed |
| US-20260047371-A1 | METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION | TOKYO ELECTRON LTD (JP) | 2026-02-12 | — | — | US | claimed |
| EP-0428623-A1 | PRODUCTION OF RADIOIODINATED 1-$g(b)-D-ARABINOFURANOSYL)-5(E)-(2-IODOVINYL)URACIL, AND USES THEREOF, AND RELATED ANALOGUES INCORPORATING ALTERNATIVE HALOGEN RADIONUCLIDES, THE GENERAL RADIOHALOGENATION PRECURSORS, 1-(2,3,5-TRI-O-ACETYL-$g(b)-D-ARABINOFURANOSYL)-5(Z and E)-(2-TRIMETHYLSILYLVINYL)URAC | SACKS, Stephen Leslie (CA) | 1991-05-29 | — | — | EP | claimed |
| WO-1990001324-A1 | PRODUCTION OF RADIOIODINATED 1-β-D-ARABINOFURANOSYL)-5(E)-(2-IODOVINYL)URACIL, AND USES THEREOF, AND RELATED ANALOGUES INCORPORATING ALTERNATIVE HALOGEN RADIONUCLIDES, THE GENERAL RADIOHALOGENATION PRECURSORS, 1-(2,3,5-TRI-O-ACETYL-β-D-ARABINOFURANOSYL)-5(Z and E)-(2-TRIMETHYLSILYLVINYL)URACIL, PROCESSES FOR RADIOHA | SACKS STEPHEN LESLIE (CA) | 1990-02-22 | — | — | WO | claimed |
| EP-0246061-A2 | A benzoylurea derivative and its production and use | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-11-19 | — | — | EP | claimed |
| US-4704484-A | DECARBOXYLATION AND FLUORINATION WITH XENON DIFLUORIDE | MALLINCKRODT, INC. (US) | 1987-11-03 | — | — | US | claimed |
| US-4551197-A | Method and apparatus for the recovery and recycling of condensable gas reactants | GUILMETTE JOSEPH G | 1985-11-05 | — | — | US | claimed |
| EP-0031982-B1 | 3-SUBSTITUTED-3-FLUOROPYRUVIC ACIDS AND THEIR ESTERS AND SALTS, AND PRODUCTION THEREOF | Daikin Kogyo Co., Ltd. (JP) | 1985-06-05 | — | — | EP | claimed |
| US-4478677-A | Laser induced dry etching of vias in glass with non-contact masking | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1984-10-23 | — | — | US | claimed |
| US-4390702-A | 3-Substituted-3-fluoropyruvic acids and their esters and salts, and production thereof | DAIKAN KOGYO CO., LTD. (JP) | 1983-06-28 | — | — | US | claimed |
| US-4128707-A | XENON DIFLUORIDE | SHUSTOVA OLGA A | 1978-12-05 | — | — | US | claimed |
| US-4001135-A | XENON FLUORIDE, FLUOROPOLYMER | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1977-01-04 | — | — | US | claimed |