SCHEMBL15426657

SCHEMBL15426657

CC(=O)OCOS(C)(=O)=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.42
LMNA P02545 2/20 0.42
HSD17B10 Q99714 1/20 0.42
TSHR P16473 4/20 0.40
USP2 O75604 2/20 0.40
KDM4E B2RXH2 1/20 0.40
MMP9 P14780 1/20 0.40
ALOX15 P16050 1/20 0.40
CHRM5 P08912 2/20 0.34
CHRM1 P11229 2/20 0.34
CHRM3 P20309 2/20 0.34
PGR P06401 1/20 0.34
CHRM2 P08172 1/20 0.34
CHRM4 P08173 1/20 0.34
HTR1A P08908 1/20 0.34
CHRNB2 P17787 1/20 0.34
TBXA2R P21731 1/20 0.34
CHRNB4 P30926 1/20 0.34
CHRNA3 P32297 1/20 0.34
CHRNA7 P36544 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclopropane SCHEMBL2479617 0.93 ALDH1A1 (0.37) ALDH1A1LMNAHSD17B10TSHRUSP2
SCHEMBL15426658 0.82 ALDH1A1 (0.36) ALDH1A1LMNAHSD17B10TSHRUSP2
SCHEMBL15383922 0.78 ALDH1A1 (0.46) ALDH1A1LMNAHSD17B10TSHRCHRM5
SCHEMBL2169178 0.78 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TSHRUSP2
Methanesulfonic Acid Ethyl Ester SCHEMBL28517023 0.76 ALDH1A1 (0.64) ALDH1A1LMNAHSD17B10TSHRUSP2
SCHEMBL14849328 0.76 KDM4E (0.37) ALDH1A1LMNATSHRUSP2KDM4E
SCHEMBL2167190 0.75 ALDH1A1 (0.58) ALDH1A1LMNAHSD17B10TSHRUSP2
SCHEMBL1960864 0.75 ALDH1A1 (0.65) ALDH1A1LMNAHSD17B10TSHRUSP2
SCHEMBL783382 0.74 USP2 (0.56) ALDH1A1LMNATSHRUSP2KDM4E
SCHEMBL322669 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075304-B2 Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-07-07 US disclosed
US-20140017617-A1 METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COMPOUND, AND COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2014-01-16 US disclosed