SCHEMBL15426658

SCHEMBL15426658

CC(=O)OCOC(=O)COS(C)(=O)=O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.36
LMNA P02545 2/20 0.36
HSD17B10 Q99714 1/20 0.36
TSHR P16473 2/20 0.34
KDM4E B2RXH2 1/20 0.34
USP2 O75604 1/20 0.34
MMP9 P14780 1/20 0.34
ALOX15 P16050 1/20 0.34
TDP1 Q9NUW8 2/20 0.31
THRB P10828 1/20 0.31
PGR P06401 1/20 0.30
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
HTR1A P08908 1/20 0.30
CHRM5 P08912 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRNB2 P17787 1/20 0.30
CHRM3 P20309 1/20 0.30
TBXA2R P21731 1/20 0.30
CHRNB4 P30926 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15426657 0.82 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10TSHRKDM4E
SCHEMBL3441164 0.78 GAA (0.48) ALDH1A1LMNAHSD17B10TSHRKDM4E
Cyclopropane SCHEMBL2479617 0.77 ALDH1A1 (0.37) ALDH1A1LMNAHSD17B10TSHRKDM4E
SCHEMBL7550561 0.75 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10TSHRUSP2
SCHEMBL322669 0.74
SCHEMBL3441325 0.73 TSHR (0.43) ALDH1A1LMNAHSD17B10TSHRKDM4E
SCHEMBL6578001 0.72
SCHEMBL2391746 0.72 CA12 (0.36) ALDH1A1LMNATSHRKDM4EUSP2
SCHEMBL3441107 0.72 TDP1 (0.49) ALDH1A1LMNAHSD17B10TSHRKDM4E
SCHEMBL6271337 0.72 NAAA (0.47) ALDH1A1LMNATSHRKDM4EUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075304-B2 Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-07-07 US disclosed
US-20140017617-A1 METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COMPOUND, AND COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2014-01-16 US disclosed