Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.47 |
| ▸ | LCK | P06239 | 1/20 | 0.47 |
| ▸ | FYN | P06241 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL6125476 | 0.97 | FFAR3 (0.44) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL4543690 | 0.97 | FFAR3 (0.44) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL4539715 | 0.97 | FFAR3 (0.44) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL4544141 | 0.97 | FFAR3 (0.44) | FFAR3LCKFYN | |
| Acetic Acid SCHEMBL28871134 | 0.94 | FFAR3 (0.41) | FFAR3LCKFYN | |
| Benzene SCHEMBL8197459 | 0.94 | FFAR3 (0.41) | FFAR3LCKFYNSMN1; SMN2 | |
| Acetic Acid SCHEMBL1704983 | 0.93 | — | — | |
| Acetone SCHEMBL4379179 | 0.90 | LMNA (0.43) | FFAR3LCKFYNLMNASMN1; SMN2 | |
| Acetic Acid SCHEMBL8158174 | 0.89 | FFAR3 (0.58) | FFAR3LCKFYNLMNASMN1; SMN2 | |
| Bicarbonate SCHEMBL27155214 | 0.86 | CA1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114181137-A | Para-aryl substituted pyridinium derivative electrochromic material and preparation method thereof | 黎伟麒 | 2022-03-15 | — | — | CN | claimed |
| EP-3589677-B1 | A COMPOSITION, ITS PRODUCTION AND USE THEREOF | COVESTRO DEUTSCHLAND AG (DE) | 2023-04-12 | — | — | EP | disclosed |
| CN-115698179-A | Composition and preparation method and application thereof | 科思创德国股份有限公司 | 2023-02-03 | — | — | CN | disclosed |
| CN-114829516-A | Composition and preparation method and application thereof | 科思创知识产权两合公司 | 2022-07-29 | — | — | CN | disclosed |
| CN-114605882-A | Water-based paint composition and preparation method thereof | 科思创德国股份有限公司 | 2022-06-10 | — | — | CN | disclosed |
| CN-108504078-B | Composition and preparation method and application thereof | 科思创聚合物（中国）有限公司 | 2022-04-19 | — | — | CN | disclosed |
| CN-110959020-B | Compositions, their preparation and their use | 科思创德国股份有限公司 | 2022-04-15 | — | — | CN | disclosed |
| CN-114181137-A | Para-aryl substituted pyridinium derivative electrochromic material and preparation method thereof | 黎伟麒 | 2022-03-15 | — | — | CN | disclosed |
| CN-114149779-A | Adhesive composition, preparation method and application thereof | 科思创德国股份有限公司 | 2022-03-08 | — | — | CN | disclosed |
| CN-113801554-A | Composition and preparation method and application thereof | 科思创德国股份有限公司 | 2021-12-17 | — | — | CN | disclosed |
| CN-112823174-A | Polyurethane composition, preparation method and application thereof | 科思创知识产权两合公司 | 2021-05-18 | — | — | CN | disclosed |
| CN-112795298-A | Composition and preparation method and application thereof | 科思创德国股份有限公司 | 2021-05-14 | — | — | CN | disclosed |
| CN-110959020-A | Compositions, their preparation and their use | 科思创德国股份有限公司 | 2020-04-03 | — | — | CN | disclosed |
| CN-110857329-A | Polyurethane composition and preparation method and application thereof | 科思创德国股份有限公司 | 2020-03-03 | — | — | CN | disclosed |
| CN-110857385-A | Composition and preparation method and application thereof | 科思创德国股份有限公司 | 2020-03-03 | — | — | CN | disclosed |
| US-20200062994-A1 | A COMPOSITION, ITS PRODUCTION AND USE THEREOF | COVESTRO DEUTSCHLAND AG (DE) | 2020-02-27 | — | — | US | disclosed |
| WO-2018158278-A1 | A COMPOSITION, ITS PRODUCTION AND USE THEREOF | COVESTRO DEUTSCHLAND AG (DE) | 2018-09-07 | — | — | WO | disclosed |
| US-9563124-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| CN-105199470-A | Pearlized paint and preparation method thereof | SUN DALONG | 2015-12-30 | — | — | CN | disclosed |
| US-20140030654-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-30 | — | — | US | disclosed |