Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.54 |
| ▸ | MEN1 | O00255 | 1/20 | 0.54 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | TAS1R3 | Q7RTX0 | 5/20 | 0.53 |
| ▸ | TAS1R1 | Q7RTX1 | 5/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.53 |
| ▸ | TAS1R2 | Q8TE23 | 4/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.51 |
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
| ▸ | TSHR | P16473 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1266129 | 0.85 | HTT (0.63) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL606392 | 0.85 | HTT (0.63) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL15006999 | 0.85 | HTT (0.63) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL10284322 | 0.82 | TAS1R3 (0.50) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL14335627 | 0.80 | HTT (0.63) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL16301130 | 0.80 | HTT (0.63) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL15705319 | 0.78 | HTT (0.68) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL13569354 | 0.77 | HTT (0.64) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL599005 | 0.76 | MTNR1A (0.57) | HTTALDH1A1KMT2AMEN1EPHX1 | |
| SCHEMBL1987710 | 0.76 | MTNR1A (0.57) | HTTALDH1A1KMT2AMEN1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9023579-B2 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8647812-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-02-11 | — | — | US | disclosed |