SCHEMBL15468698

SCHEMBL15468698

O=C(NC1CC2CCC1C2)C(C(F)(F)F)(C(F)(F)F)S(=O)(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 5/20 0.48
EPHX1 P07099 1/20 0.43
TAS1R3 Q7RTX0 1/20 0.42
TAS1R1 Q7RTX1 1/20 0.42
TAS1R2 Q8TE23 1/20 0.42
HSD11B1 P28845 1/20 0.41
HTT P42858 1/20 0.40
PANK3 Q9H999 1/20 0.40
ALDH1A1 P00352 3/20 0.39
HPGD P15428 2/20 0.39
CYP3A4 P08684 1/20 0.39
KDM4E B2RXH2 1/20 0.39
TSHR P16473 1/20 0.39
HSD17B10 Q99714 1/20 0.39
SIGMAR1 Q99720 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.37
GRIN2D O15399 1/20 0.37
GRIN3B O60391 1/20 0.37
GRIN1 Q05586 1/20 0.37
GRIN2A Q12879 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10272972 0.85 EPHX2 (0.50) EPHX2EPHX1TAS1R3TAS1R1TAS1R2
SCHEMBL14556849 0.77 EPHX2 (0.47) EPHX2EPHX1TAS1R3TAS1R1TAS1R2
SCHEMBL16608917 0.74 POLB (0.40) EPHX2HSD11B1HTTALDH1A1HPGD
SCHEMBL12994514 0.73 EPHX2 (0.44) EPHX2EPHX1TAS1R3TAS1R1TAS1R2
SCHEMBL16301142 0.73 EPHX2 (0.57) EPHX2EPHX1TAS1R3TAS1R1TAS1R2
SCHEMBL20439407 0.72 EPHX2 (0.36) EPHX2EPHX1TAS1R3TAS1R1TAS1R2
SCHEMBL12994556 0.71 EPHX2 (0.43) EPHX2EPHX1TAS1R3TAS1R1TAS1R2
SCHEMBL10273081 0.71 EPHX2 (0.47) EPHX2EPHX1TAS1R3TAS1R1TAS1R2
SCHEMBL14389928 0.70 SCN9A (0.35) EPHX2HTTALDH1A1HPGDKDM4E
SCHEMBL14803218 0.70 EPHX2 (0.50) EPHX2EPHX1TAS1R3TAS1R1TAS1R2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8647812-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-02-11 US disclosed
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed