SCHEMBL20439407

SCHEMBL20439407

O=C(NC1CCC2CC3CC(C2)CC1C3)C(F)(F)S(=O)(=O)O

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 4/20 0.36
L3MBTL1 Q9Y468 2/20 0.33
HSD17B10 Q99714 2/20 0.33
ALDH1A1 P00352 3/20 0.32
KDM4E B2RXH2 1/20 0.32
HPGD P15428 1/20 0.32
TSHR P16473 1/20 0.32
EPHX1 P07099 1/20 0.32
HSD11B1 P28845 2/20 0.32
LMNA P02545 1/20 0.32
HTT P42858 1/20 0.32
TAS1R3 Q7RTX0 1/20 0.31
TAS1R1 Q7RTX1 1/20 0.31
TAS1R2 Q8TE23 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10272972 0.86 EPHX2 (0.50) EPHX2HSD17B10ALDH1A1KDM4EHPGD
SCHEMBL10272629 0.81 EPHX2 (0.45) EPHX2L3MBTL1HSD17B10HSD11B1
SCHEMBL15468698 0.72 EPHX2 (0.48) EPHX2HSD17B10ALDH1A1KDM4EHPGD
SCHEMBL16301151 0.71 MEN1 (0.38) EPHX2HSD17B10HPGD
SCHEMBL19901965 0.70 ALDH1A1 (0.32) L3MBTL1ALDH1A1
SCHEMBL10284306 0.70 PDK1 (0.33) L3MBTL1ALDH1A1
SCHEMBL14553965 0.68 PDK1 (0.51) EPHX2L3MBTL1ALDH1A1KDM4EHPGD
SCHEMBL12256434 0.68 POLB (0.42) EPHX2L3MBTL1HSD17B10ALDH1A1KDM4E
SCHEMBL3216831 0.67 PDK1 (0.54) EPHX2ALDH1A1KDM4EHPGDEPHX1
SCHEMBL12333880 0.67 PDK1 (0.54) EPHX2ALDH1A1KDM4EHPGDEPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210200097-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2021-07-01 US disclosed
US-10962884-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2021-03-30 US disclosed
US-20180217503-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2018-08-02 US disclosed