SCHEMBL15475779

SCHEMBL15475779

O=CCCOC(=O)CN(CC(=O)OCCC=O)c1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PPARG P37231 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15475501 0.84
SCHEMBL320984 0.83 RAB9A (0.39) PPARG
SCHEMBL15476387 0.83
SCHEMBL15476095 0.83
SCHEMBL15476214 0.83 PPARG (0.32) PPARG
SCHEMBL15476091 0.83
SCHEMBL15475781 0.81
SCHEMBL15477865 0.73 MEN1 (0.31)
SCHEMBL15475653 0.72 HPSE (0.31)
SCHEMBL15475756 0.72 SMN1; SMN2 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8980506-B2 Photosensitive resin composition and application thereof CHI MEI CORPORATION (TW) 2015-03-17 US disclosed
US-20140051017-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2014-02-20 US disclosed