SCHEMBL320984

SCHEMBL320984

CCOC(=O)CN(CC(=O)OCC)c1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.39
PPARG P37231 1/20 0.39
KDM4E B2RXH2 3/20 0.38
LMNA P02545 2/20 0.38
PKM P14618 1/20 0.38
TSHR P16473 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
PRNP P04156 1/20 0.36
CYP1A2 P05177 1/20 0.36
POLB P06746 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
RXFP1 Q9HBX9 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
AR P10275 1/20 0.35
ALDH1A1 P00352 4/20 0.34
TP53 P04637 2/20 0.34
HPGD P15428 2/20 0.34
HSD17B10 Q99714 2/20 0.34
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL391755 0.86 MAPK1 (0.38) RAB9APPARGKDM4ELMNAPKM
SCHEMBL388672 0.83 AR (0.37) PPARGKDM4ELMNAPKML3MBTL1
SCHEMBL391447 0.83 AR (0.37) RAB9APPARGKDM4ELMNAPKM
SCHEMBL15475779 0.83 PPARG (0.30) PPARG
SCHEMBL29859903 0.82 AR (0.37) RAB9APPARGKDM4ELMNAPKM
SCHEMBL394048 0.82 RAB9A (0.38) RAB9APPARGKDM4ELMNAPKM
SCHEMBL15475781 0.82
SCHEMBL388904 0.82 AR (0.37) RAB9APPARGKDM4ELMNAPKM
SCHEMBL12157365 0.82 GSTO1 (0.36) RAB9AKDM4ELMNAPKMTSHR
SCHEMBL7761580 0.82 LMNA (0.39) RAB9AKDM4ELMNAPKMTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 281 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118302462-A Polymer composition and single layer phase difference material 日产化学株式会社 2024-07-05 CN disclosed
US-20240016965-A1 ULTRAVIOLET-SENSING MEMBER AND ULTRAVIOLET-SENSING KIT FUJIFILM CORPORATION (JP) 2024-01-18 US disclosed
CN-116601191-A Method for producing single-layer retardation film, and polymer composition for forming single-layer retardation film 日产化学株式会社 2023-08-15 CN disclosed
WO-2023095925-A1 POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL 日産化学株式会社 2023-06-01 WO disclosed
WO-2022210639-A1 METHOD FOR PRODUCING PATTERNED SINGLE-LAYER PHASE DIFFERENCE FILM, AND SINGLE-LAYER PHASE DIFFERENCE FILM-FORMING POLYMER COMPOSITION 日産化学株式会社 2022-10-06 WO disclosed
WO-2022138932-A1 METHOD FOR PRODUCING SINGLE-LAYER PHASE DIFFERENCE FILM AND SINGLE-LAYER PHASE DIFFERENCE FILM-FORMING POLYMER COMPOSITION 日産化学株式会社 2022-06-30 WO disclosed
US-10591816-B2 Photosensitive resin composition, color filter, and liquid crystal display element thereof CHI MEI CORPORATION (TW) 2020-03-17 US disclosed
US-9939568-B2 Photosensitive resin composition for color filter and application of the same CHI MEI CORPORATION (TW) 2018-04-10 US disclosed
US-20180004086-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2018-01-04 US disclosed
US-20170235224-A1 PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF CHI MEI CORPORATION (TW) 2017-08-17 US disclosed
EP-0780239-A2 Negative-working image recording material FUJI PHOTO FILM CO., LTD. (JP) 1997-06-25 EP disclosed
EP-0595179-B1 Method for preparing an aluminum substrate for lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 1997-03-19 EP disclosed
EP-0674224-A1 Photosensitive composition and image formation using the same FUJI PHOTO FILM CO., LTD. (JP) 1995-09-27 EP disclosed
EP-0633500-A1 Photosensitive composition and process for image formation FUJI PHOTO FILM CO., LTD. (JP) 1995-01-11 EP disclosed
EP-0320264-B1 Colour filter MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1994-04-27 EP disclosed
EP-0589309-A1 Positive-working presensitized plate for use in making lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 1994-03-30 EP disclosed
EP-0262788-B1 Light-sensitive composition FUJI PHOTO FILM CO LTD (JP) 1993-11-10 EP disclosed
US-5064741-A Bis/halomethyl/triazines as Free Radical Generators FUJI PHOTO FILM CO., LTD. (JP) 1991-11-12 US disclosed
US-4934791-A PHOTOSENSITIVE ACRYLATE MONOMER, PIGMENTS, A BINDER AND A PHOTOPOLYMERIZATION INITIATOR MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1990-06-19 US disclosed
EP-0320264-A2 Colour filter MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1989-06-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240016965-A1 ULTRAVIOLET-SENSING MEMBER AND ULTRAVIOLET-SENSING KIT KIT, SARS1, UNG RAB9A 1630/4885PPARG 4629/4885KDM4E 869/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.