Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | FABP3 | P05413 | 1/20 | 0.32 |
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.32 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 4/20 | 0.32 |
| ▸ | HTR2C | P28335 | 4/20 | 0.32 |
| ▸ | HTR2B | P41595 | 2/20 | 0.32 |
| ▸ | AHR | P35869 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1547749 | 0.80 | ALDH1A1 (0.40) | CYP3A4MRGPRX4TDP1 | |
| SCHEMBL2089458 | 0.77 | CYP3A4 (0.36) | CYP3A4MAPK1FABP3MRGPRX4GPR84 | |
| SCHEMBL9486392 | 0.77 | HTR2A (0.33) | CYP3A4MAPK1MRGPRX4GPR84HTR2A | |
| SCHEMBL9243827 | 0.74 | MRGPRX4 (0.31) | CYP3A4MAPK1MRGPRX4GPR84HTR2A | |
| SCHEMBL53547 | 0.73 | ALDH1A1 (0.46) | CYP3A4MAPK1HTR2AHTR2CHTR2B | |
| SCHEMBL30715275 | 0.73 | ALDH1A1 (0.46) | CYP3A4MAPK1HTR2AHTR2CHTR2B | |
| SCHEMBL9067780 | 0.72 | CYP1A2 (0.52) | MAPK1GPR84TDP1 | |
| SCHEMBL11283671 | 0.72 | CYP3A4 (0.43) | CYP3A4MAPK1FABP3MRGPRX4GPR84 | |
| SCHEMBL1547763 | 0.71 | TTR (0.47) | TDP1 | |
| SCHEMBL1547838 | 0.71 | TP53 (0.42) | CYP3A4HTR2ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8980506-B2 | Photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2015-03-17 | — | — | US | disclosed |
| US-20140051017-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2014-02-20 | — | — | US | disclosed |