SCHEMBL15475852

SCHEMBL15475852

CC(C)(c1ccc(O)cc1)c1ccc(C(Cc2ccc(O)cc2)c2ccc(O)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 16/20 0.57
ESR2 Q92731 16/20 0.57
CYP3A4 P08684 3/20 0.57
SLC6A2 P23975 2/20 0.57
AR P10275 1/20 0.57
HPGD P15428 1/20 0.57
TSHR P16473 1/20 0.57
SLC6A4 P31645 1/20 0.57
HTR6 P50406 1/20 0.57
ESRRG P62508 1/20 0.57
SLC6A3 Q01959 1/20 0.57
HSD17B10 Q99714 1/20 0.57
ALDH1A1 P00352 2/20 0.55
TAAR1 Q96RJ0 2/20 0.44
MEN1 O00255 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
KMT2A Q03164 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3354777 1.00 ESR1 (0.57) ESR1ESR2CYP3A4SLC6A2AR
SCHEMBL28340138 0.92 ESR1 (0.59) ESR1ESR2CYP3A4SLC6A2AR
Orthocresol SCHEMBL29223985 0.87 ESR1 (0.50) ESR1ESR2CYP3A4SLC6A2AR
SCHEMBL30320268 0.86 ESR1 (0.43) ESR1ESR2CYP3A4SLC6A2AR
SCHEMBL28680993 0.86 ESR1 (0.43) ESR1ESR2CYP3A4SLC6A2AR
SCHEMBL231792 0.84 ESR1 (0.61) ESR1ESR2CYP3A4SLC6A2ALDH1A1
SCHEMBL10456186 0.84 ESR1 (0.76) ESR1ESR2CYP3A4SLC6A2AR
SCHEMBL28684690 0.83 ESR1 (0.53) ESR1ESR2CYP3A4SLC6A2AR
SCHEMBL5679013 0.82 ESR1 (0.44) ESR1ESR2CYP3A4SLC6A2AR
Bisphenol A SCHEMBL268449 0.81 ESR1 (0.61) ESR1ESR2CYP3A4SLC6A2AR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122063815-A Positive photosensitive resin composition and interlayer insulating film 阜阳欣奕华新材料科技股份有限公司 2026-05-19 CN claimed
CN-119439619-A Photosensitive resin composition, microlens, method of preparing the same, and optical device 阜阳欣奕华新材料科技股份有限公司 2025-02-14 CN claimed
CN-116209725-B Reversible thermochromic composition and reversible thermochromic microcapsule pigment having the same encapsulated therein 百乐墨水株式会社 2024-12-31 CN claimed
CN-115933316-A Positive photoresist composition, positive photoresist and MEMS stressed element 广州微纳芯材料科技有限公司 2023-04-07 CN claimed
CN-122063815-A Positive photosensitive resin composition and interlayer insulating film 阜阳欣奕华新材料科技股份有限公司 2026-05-19 CN disclosed
CN-122055676-A Resin composition, cured product, display device, or semiconductor device 东丽株式会社 2026-05-15 CN disclosed
CN-110286561-B Radiation-sensitive composition, cured film, and display element JSR株式会社 2025-06-03 CN disclosed
CN-120077771-A Curable composition for organic EL element, cured product for organic EL element, method for producing cured product for organic EL element, and polymer JSR株式会社 2025-05-30 CN disclosed
CN-119816381-A Method for producing conductive film, dispersion liquid, radiation-sensitive resin composition, and light-emitting element JSR株式会社 2025-04-11 CN disclosed
CN-119781249-A Positive photosensitive resin composition, organic EL element barrier wall, organic EL element insulating film, and organic EL element 日保丽公司 2025-04-08 CN disclosed
CN-119768471-A Resin composition, cured product, and organic EL display device 东丽株式会社 2025-04-04 CN disclosed
CN-119709173-A Reversible thermochromic composition and reversible thermochromic microcapsule pigment having the same encapsulated therein 百乐墨水株式会社 2025-03-28 CN disclosed
CN-111032788-A Resin composition and resin film 日本瑞翁株式会社 2020-04-17 CN disclosed
CN-110998442-A Positive radiation-sensitive resin composition 日本瑞翁株式会社 2020-04-10 CN disclosed
CN-106104380-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社 2020-03-06 CN disclosed
CN-104871089-B Photosensitive resin composition, method for producing cured film, organic EL display device, and liquid crystal display device 富士胶片株式会社 2020-01-14 CN disclosed
CN-110554566-A Positive photosensitive resin composition and cured film prepared therefrom ROHM & HAAS ELECT MATERIALS KOREA LTD 2019-12-10 CN disclosed
US-8980506-B2 Photosensitive resin composition and application thereof CHI MEI CORPORATION (TW) 2015-03-17 US disclosed
US-20140051017-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2014-02-20 US disclosed
CN-100364160-C Polymer electrolyte material, polymer electrolyte part, membrane electrode composite and polymer electrolyte type fuel cell TORAY INDUSTRIES (JP) 2008-01-23 CN disclosed