Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | TYR | P14679 | 1/20 | 0.44 |
| ▸ | BCHE | P06276 | 11/20 | 0.40 |
| ▸ | ACHE | P22303 | 11/20 | 0.40 |
| ▸ | KIF11 | P52732 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10233171 | 1.00 | TSHR (0.46) | TSHRLMNATYRBCHEACHE | |
| SCHEMBL15453139 | 0.83 | ESR1 (0.44) | RAB9ANPC1MAPT | |
| SCHEMBL14421799 | 0.83 | TSHR (0.50) | TSHRLMNABCHEACHEKIF11 | |
| SCHEMBL17266463 | 0.83 | NPC1 (0.47) | LMNARAB9APOLBATMNPC1 | |
| SCHEMBL10252587 | 0.82 | TSHR (0.48) | TSHRLMNATYRBCHEACHE | |
| SCHEMBL14527961 | 0.81 | MEN1 (0.48) | TSHRLMNAPOLBL3MBTL1MAPK1 | |
| SCHEMBL14540259 | 0.81 | MEN1 (0.48) | TSHRLMNAPOLBL3MBTL1MAPK1 | |
| SCHEMBL879532 | 0.80 | TAAR1 (0.44) | TSHRALDH1A1MAPTMAPK1 | |
| SCHEMBL14608023 | 0.80 | TAAR1 (0.44) | TSHRALDH1A1MAPTMAPK1 | |
| SCHEMBL12834072 | 0.80 | TAAR1 (0.44) | TSHRALDH1A1MAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170102618-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2017-04-13 | — | — | US | disclosed |
| US-9250532-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-8999621-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8877423-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8709704-B2 | Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20140060602-A1 | ELECTRICALLY CONDUCTIVE COMPOSITION, AN ELECTRICALLY CONDUCTIVE FILM USING THE COMPOSITION AND A METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20120094237-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |