Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | TYR | P14679 | 1/20 | 0.46 |
| ▸ | BCHE | P06276 | 12/20 | 0.41 |
| ▸ | ACHE | P22303 | 12/20 | 0.41 |
| ▸ | KIF11 | P52732 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15499713 | 0.82 | TSHR (0.46) | TSHRLMNATYRBCHEACHE | |
| SCHEMBL10233171 | 0.82 | TSHR (0.46) | TSHRLMNATYRBCHEACHE | |
| SCHEMBL14528006 | 0.79 | TSHR (0.48) | TSHRACHEKIF11ALDH1A1NPC1 | |
| SCHEMBL14395067 | 0.77 | CYP19A1 (0.47) | TSHRLMNAMAPK1 | |
| SCHEMBL424728 | 0.76 | TSHR (0.73) | TSHRLMNATYRBCHEACHE | |
| SCHEMBL3625528 | 0.76 | NPC1 (0.52) | TSHRLMNATYRBCHEACHE | |
| SCHEMBL767319 | 0.76 | KCNN4 (0.46) | TSHRALDH1A1MAPK1 | |
| SCHEMBL807575 | 0.75 | TSHR (0.55) | TSHRLMNATYRBCHEACHE | |
| Hydrogen Sulfide SCHEMBL28845172 | 0.74 | KCNN4 (0.44) | TSHRALDH1A1MAPK1 | |
| SCHEMBL14564195 | 0.73 | RORC (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9513547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-9429840-B2 | Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9217919-B2 | Photosensitive composition, pattern-forming method using the composition, and resin used in the composition | FUJIFILM CORPORATION (JP) | 2015-12-22 | — | — | US | disclosed |
| US-20150147699-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150118627-A1 | PATTERN FORMING METHOD, COMPOSITION USED TEHREIN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| US-20140234762-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-08-21 | — | — | US | disclosed |
| US-20140127629-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-05-08 | — | — | US | disclosed |
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| EP-2166049-B1 | Ink composition, inkjet recording method and method for producing printed formed article | FUJIFILM CORP (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-20120100481-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-06-30 | — | — | US | disclosed |
| EP-1840176-A1 | Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate | FUJIFILM Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |
| EP-1829684-A1 | Curable composition, ink composition, inkjet-recording method, and planographic printing plate | FUJIFILM Corporation (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1829680-A1 | Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate | FUJIFILM Corporation (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1795564-A1 | Ink composition, inkjet recording method, production method of planographic printing plate, and planographic printing plate | Fujifilm Corporation (JP) | 2007-06-13 | — | — | EP | disclosed |
| EP-1787809-A1 | Ink composition, inkjet recording method, printed material, production method of a planographic printing plate and planographic printing plate | Fujifilm Corporation (JP) | 2007-05-23 | — | — | EP | disclosed |
| EP-1770133-A1 | Curable composition, ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate | FUJIFILM Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1762599-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate | FUJIFILM Corporation (JP) | 2007-03-14 | — | — | EP | disclosed |
| EP-1757635-A1 | Curable modified oxetane compound and ink composition comprising it | Fuji Photo Film Co., Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | SUN2, LCP1, PHYKPL | TSHR 4097/4885LMNA 1348/4885TYR 79/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.