Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.44 |
| ▸ | KCNN4 | O15554 | 4/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 2/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12834072 | 1.00 | TAAR1 (0.44) | TAAR1KCNN4MAPK1TSHRCYP2C19 | |
| SCHEMBL14608023 | 1.00 | TAAR1 (0.44) | TAAR1KCNN4MAPK1TSHRCYP2C19 | |
| SCHEMBL15499713 | 0.80 | TSHR (0.46) | MAPK1TSHRALDH1A1MAPT | |
| SCHEMBL10233171 | 0.80 | TSHR (0.46) | MAPK1TSHRALDH1A1MAPT | |
| SCHEMBL20411848 | 0.80 | TAAR1 (0.44) | TAAR1KCNN4MAPK1TSHRCYP2C19 | |
| SCHEMBL767319 | 0.79 | KCNN4 (0.46) | TAAR1KCNN4MAPK1TSHRCYP2C19 | |
| SCHEMBL17266463 | 0.78 | NPC1 (0.47) | MAPK1MAPT | |
| SCHEMBL21473259 | 0.78 | CYP2C19 (0.43) | TAAR1KCNN4MAPK1TSHRCYP2C19 | |
| SCHEMBL14421799 | 0.78 | TSHR (0.50) | TSHRALDH1A1ESR1ESR2MAPT | |
| SCHEMBL15453139 | 0.78 | ESR1 (0.44) | CYP2C19HIF1AESR1ESR2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703758-B2 | Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11693321-B2 | Treatment liquid for manufacturing semiconductor, storage container storing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-07-04 | — | — | US | disclosed |
| EP-4129975-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, RESIST FILM, AND ELECTRONIC DEVICE PRODUCTION METHOD | FUJIFILM Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |
| US-20220019141-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | MERCK PATENT GMBH (DE) | 2022-01-20 | — | — | US | disclosed |
| US-11181820-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2021-11-23 | — | — | US | disclosed |
| US-20210109446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND RESIN | FUJIFILM CORPORATION (JP) | 2021-04-15 | — | — | US | disclosed |
| US-20210011377-A1 | PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-01-14 | — | — | US | disclosed |
| US-20200183280-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-06-11 | — | — | US | disclosed |
| US-10678132-B2 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM CORPORATION (JP) | 2020-06-09 | — | — | US | disclosed |
| US-10562991-B2 | Developer, pattern forming method, and electronic device manufacturing method | FUJIFILM CORPORATION (JP) | 2020-02-18 | — | — | US | disclosed |
| EP-0998468-A1 | SUBSTITUTED 3-PHENYL ISOXAZOLINES | BASF AKTIENGESELLSCHAFT (DE) | 2000-05-10 | — | — | EP | disclosed |
| WO-2000023413-A1 | METHOD FOR DRYING PHENOXYMETHYLBENZOIC ACIDS | BASF AKTIENGESELLSCHAFT (DE) | 2000-04-27 | — | — | WO | disclosed |
| EP-0971904-A1 | NOVEL 1-AMINO-3 BENZYL URACILS | BASF AKTIENGESELLSCHAFT (DE) | 2000-01-19 | — | — | EP | disclosed |
| WO-1999005130-A1 | SUBSTITUTED 3-PHENYL ISOXAZOLINES | BASF AKTIENGESELLSCHAFT (DE) | 1999-02-04 | — | — | WO | disclosed |
| EP-0891336-A1 | SUBSTITUTED 1-METHYL-3-BENZYLURACILS | BASF AKTIENGESELLSCHAFT (DE) | 1999-01-20 | — | — | EP | disclosed |
| WO-1998042682-A1 | NOVEL 1-AMINO-3 BENZYL URACILS | BASF AKTIENGESELLSCHAFT (DE) | 1998-10-01 | — | — | WO | disclosed |
| CN-1189824-A | 1-amino-3-benzyluracils | BASF AG (DE) | 1998-08-05 | — | — | CN | disclosed |
| EP-0835248-A1 | 1-AMINO-3-BENZYLURACILS | BASF AKTIENGESELLSCHAFT (DE) | 1998-04-15 | — | — | EP | disclosed |
| WO-1997035845-A1 | SUBSTITUTED 1-METHYL-3-BENZYLURACILS | BASF AKTIENGESELLSCHAFT (DE) | 1997-10-02 | — | — | WO | disclosed |
| WO-1997001543-A1 | 1-AMINO-3-BENZYLURACILS | BASF AKTIENGESELLSCHAFT (DE) | 1997-01-16 | — | — | WO | disclosed |