SCHEMBL15510951

SCHEMBL15510951

CCCCOCCCNCC

nearest known ligand 0.62

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.62
CYP2C19 P33261 2/20 0.50
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
GLA P06280 1/20 0.50
CYP1A2 P05177 1/20 0.48
ALDH1A1 P00352 3/20 0.43
SAT1 P21673 3/20 0.42
CYP3A4 P08684 1/20 0.41
KDM1A O60341 5/20 0.41
HPGD P15428 1/20 0.40
THRB P10828 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14235689 0.98 TSHR (0.59) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL22802794 0.98 TSHR (0.59) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL15511439 0.93 TSHR (0.59) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL13822687 0.92 CYP2C19 (0.58) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL4810110 0.91 TSHR (0.56) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL29174014 0.91 TSHR (0.56) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL15511106 0.91 TSHR (0.56) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL8979943 0.91 TSHR (0.56) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL22848917 0.91 TSHR (0.56) TSHRCYP2C19MEN1KMT2AGLA
SCHEMBL15510973 0.91 TSHR (0.56) TSHRCYP2C19MEN1KMT2AGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108693717-A Anticorrosive additive stripping liquid controlling composition 东友精细化工有限公司 2018-10-23 CN claimed
CN-103804980-A Cleaning solution composition for offset-printing gravure and cleaning method using the same DONGWOO FINE CHEM CO LTD 2014-05-21 CN claimed
US-20230295180-A1 PROTEIN DEGRADERS AND USES THEREOF KYMERA THERAPEUTICS, INC. 2023-09-21 US disclosed
EP-2708529-B1 METHOD FOR MANUFACTURING PARTICLES SUMITOMO CHEMICAL CO (JP) 2018-04-04 EP disclosed
US-9796831-B2 Process for producing particles SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-10-24 US disclosed
US-20160296592-A1 Methods and Compositions for the Treatment of Proteinuric Diseases THE GENERAL HOSPITAL CORPORATION 2016-10-13 US disclosed
CN-103974929-B The manufacture method of the halogen acid salt of haloalkylamine 住友化学株式会社 2016-08-24 CN disclosed
CN-103534236-B Method for producing granules 住友化学株式会社 2016-08-17 CN disclosed
CN-102850838-B Offset printing intaglio plate cleaning liquid composition and the washing methods using said composition TONGWOO FINE CHEMICALS CO., LTD. (KR) 2016-01-13 CN disclosed
CN-103974929-A Method for producing hydrohalic acid salt of halogenated alkyl amine SUMITOMO CHEMICAL CO 2014-08-06 CN disclosed
CN-103804980-A Cleaning solution composition for offset-printing gravure and cleaning method using the same DONGWOO FINE CHEM CO LTD 2014-05-21 CN disclosed
EP-2708529-A1 METHOD FOR MANUFACTURING PARTICLES Sumitomo Chemical Company Limited (JP) 2014-03-19 EP disclosed
US-20140065337-A1 PROCESS FOR PRODUCING PARTICLES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-03-06 US disclosed
CN-103534236-A Method for producing granules SUMITOMO CHEMICAL CO 2014-01-22 CN disclosed
CN-102850838-A Intaglio washing solution composition used for offset printing and washing method using the same DONGWOO FINE CHEM CO LTD 2013-01-02 CN disclosed
CN-1312535-C Optical photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-04-25 CN disclosed
CN-1444103-A Optical photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL CO (JP) 2003-09-24 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160296592-A1 Methods and Compositions for the Treatment of Proteinuric Diseases ITGB3, PLAUR, PROC TSHR 2924/4885CYP2C19 4008/4885MEN1 3989/4885
US-20230295180-A1 PROTEIN DEGRADERS AND USES THEREOF MDM2, CUL1, PSMG3 TSHR 3432/4885CYP2C19 3642/4885MEN1 2643/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.