SCHEMBL15511002

SCHEMBL15511002

CCCCCCCCOCCCNC

nearest known ligand 0.64

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.64
HTT P42858 2/20 0.52
THRB P10828 2/20 0.52
MEN1 O00255 1/20 0.52
KMT2A Q03164 1/20 0.52
MAPT P10636 1/20 0.52
CES2 O00748 2/20 0.44
TSHR P16473 2/20 0.41
ALDH1A1 P00352 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
USP2 O75604 1/20 0.41
EPHX2 P34913 2/20 0.41
PLA2G2C Q5R387 1/20 0.41
CES1 P23141 1/20 0.39
HTR1B P28222 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8979942 1.00 EPHX1 (0.64) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL15510919 1.00 EPHX1 (0.64) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL2599824 0.98 EPHX1 (0.59) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL13997666 0.95 EPHX1 (0.56) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL722968 0.95 EPHX1 (0.71) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL15279667 0.95 EPHX1 (0.71) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL20548046 0.95 EPHX1 (0.71) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL22296973 0.95 EPHX1 (0.71) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL8979926 0.93 EPHX1 (0.67) EPHX1HTTTHRBMEN1KMT2A
SCHEMBL23342876 0.91 EPHX1 (0.64) EPHX1HTTTHRBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108291228-A C/EBP α SARNA compositions and methods of use 米纳治疗有限公司 2018-07-17 CN disclosed
EP-2708529-B1 METHOD FOR MANUFACTURING PARTICLES SUMITOMO CHEMICAL CO (JP) 2018-04-04 EP disclosed
US-9796831-B2 Process for producing particles SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-10-24 US disclosed
CN-103974929-B The manufacture method of the halogen acid salt of haloalkylamine 住友化学株式会社 2016-08-24 CN disclosed
CN-103534236-B Method for producing granules 住友化学株式会社 2016-08-17 CN disclosed
CN-103974929-A Method for producing hydrohalic acid salt of halogenated alkyl amine SUMITOMO CHEMICAL CO 2014-08-06 CN disclosed
EP-2708529-A1 METHOD FOR MANUFACTURING PARTICLES Sumitomo Chemical Company Limited (JP) 2014-03-19 EP disclosed
US-20140065337-A1 PROCESS FOR PRODUCING PARTICLES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-03-06 US disclosed
CN-103534236-A Method for producing granules SUMITOMO CHEMICAL CO 2014-01-22 CN disclosed