SCHEMBL1553250

SCHEMBL1553250

Nc1cc(N)cc(C(=O)OCC(F)(F)C(F)(F)F)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.41
SERPINE1 P05121 4/20 0.40
MAPK1 P28482 1/20 0.37
HIF1A Q16665 1/20 0.37
LMNA P02545 2/20 0.36
CYP1A2 P05177 2/20 0.36
CYP3A4 P08684 2/20 0.36
MAOA P21397 1/20 0.36
ELANE P08246 1/20 0.36
ALDH1A1 P00352 1/20 0.34
MAPT P10636 1/20 0.34
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
CA14 Q9ULX7 1/20 0.33
ADRB2 P07550 1/20 0.33
ADRB1 P08588 1/20 0.33
ADRB3 P13945 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8975672 0.90 NPC1 (0.39) NPC1SERPINE1MAPK1HIF1ALMNA
SCHEMBL1993609 0.75 MAPK1 (0.67) NPC1MAPK1HIF1ALMNACYP1A2
SCHEMBL12954633 0.73 NPC1 (0.37) NPC1SERPINE1LMNACYP1A2CYP3A4
SCHEMBL1553293 0.73 KDM4E (0.32)
SCHEMBL12954433 0.72 NPC1 (0.36) NPC1SERPINE1LMNACYP1A2CYP3A4
SCHEMBL7650928 0.72 SERPINE1 (0.55) NPC1SERPINE1LMNACYP1A2CYP3A4
SCHEMBL1278720 0.72 NPC1 (0.68) NPC1MAPK1LMNACYP1A2CYP3A4
SCHEMBL27823311 0.71 NPC1 (0.41) NPC1SERPINE1LMNACYP1A2CYP3A4
SCHEMBL9478551 0.71 HIF1A (0.49) NPC1SERPINE1MAPK1HIF1ALMNA
SCHEMBL4430781 0.71 NPC1 (0.57) NPC1SERPINE1LMNACYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6927012-B2 Polyamic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-08-09 US claimed
EP-1411088-B1 POLYAMIC ACID RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2013-08-21 EP disclosed
EP-1329769-B1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2011-04-27 EP disclosed
US-6927012-B2 Polyamic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-08-09 US disclosed
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US disclosed
US-20040175646-A1 Polyamic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-09 US disclosed
EP-1411088-A1 POLYAMIC ACID RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2004-04-21 EP disclosed
US-20040048188-A1 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-03-11 US disclosed
EP-1329769-A1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2003-07-23 EP disclosed