SCHEMBL155452

SCHEMBL155452

CC(N1C(=O)C=CC1=O)S(=O)(=O)O

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ MGLL Q99685 4/20 0.35
▸ GSK3A P49840 1/20 0.35
▸ GSK3B P49841 1/20 0.35
▸ GMNN O75496 1/20 0.31
▸ ALDH1A1 P00352 1/20 0.31
▸ LMNA P02545 1/20 0.31
▸ MAPT P10636 1/20 0.31
▸ THPO P40225 1/20 0.31
▸ BLM P54132 1/20 0.31
▸ PMP22 Q01453 1/20 0.31
▸ NPSR1 Q6W5P4 1/20 0.31
▸ FAAH O00519 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4887533 0.81 MGLL (0.38) MGLLGSK3AGSK3BGMNNALDH1A1
SCHEMBL27435151 0.77 MGLL (0.35) MGLLGSK3AGSK3BGMNNALDH1A1
SCHEMBL27433355 0.74 MGLL (0.32) MGLLGSK3AGSK3B
SCHEMBL4896905 0.72 GSK3A (0.31) MGLLGSK3AGSK3B
SCHEMBL17325371 0.71 SRC (0.31) —
SCHEMBL331187 0.70 MGLL (0.41) MGLLGSK3AGSK3BGMNNALDH1A1
SCHEMBL29017 0.69 MGLL (0.45) MGLLGSK3AGSK3BGMNNALDH1A1
SCHEMBL43978 0.69 MGLL (0.45) MGLLGSK3AGSK3BGMNNALDH1A1
SCHEMBL27458810 0.69 CA1 (0.42) MGLLALDH1A1LMNAMAPT
SCHEMBL11457779 0.68 MGLL (0.42) MGLLGSK3AGSK3BGMNNALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250183044-A1 SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT FUJIMI INCORPORATED (JP) 2025-06-05 — — US disclosed
US-12249513-B2 Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment FUJIMI INCORPORATED (JP) 2025-03-11 — — US disclosed
EP-3749738-B1 VISCOELASTIC, SOLID SURFACTANT COMPOSITION HENKEL AG & CO KGAA (DE) 2024-08-14 — — EP disclosed
US-20240141161-A1 BIODEGRADABLE RESIN AQUEOUS DISPERSION, FILM FORMING AGENT USING SAME, AND METHOD FOR FORMING FILM MIYOSHI OIL & FAT CO.,LTD. (JP) 2024-05-02 — — US disclosed
EP-3864121-B1 LAUNDRY DETERGENT COMPOSITION COMPRISING A CATECHOL METAL COMPLEX COMPOUND HENKEL AG & CO KGAA (DE) 2023-11-29 — — EP disclosed
EP-3749739-B1 DETERGENT COMPOSITION HAVING A FLOW LIMIT HENKEL AG & CO KGAA (DE) 2023-06-21 — — EP disclosed
CN-111885997-B Water-absorbing abrasive, method for producing same, and cosmetic 住友精化株式会社 2023-05-09 — — CN disclosed
CN-115703207-A Surface treatment method, method for manufacturing semiconductor substrate, surface treatment composition, and system for manufacturing semiconductor substrate 福吉米株式会社 2023-02-17 — — CN disclosed
US-20230053210-A1 SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT FUJIMI INCORPORATED (JP) 2023-02-16 — — US disclosed
CN-111902581-B Sandbag and manufacturing method thereof 住友精化株式会社 2023-02-03 — — CN disclosed
US-5292835-A Acrylic ester polymers BASF AKTIENGESELLSCHAFT (DE) 1994-03-08 — — US disclosed
EP-0368563-B1 Drilling fluid additives NIPPON CATALYTIC CHEM IND (JP) 1994-02-16 — — EP disclosed
EP-0337694-B1 Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer NIPPON CATALYTIC CHEM IND (JP) 1993-12-29 — — EP disclosed
US-5135677-A Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer NIPPON SHOKUBAI CO., LTD. (JP) 1992-08-04 — — US disclosed
EP-0467700-A2 Coconjugate vaccines comprising immunogenic protein, HIV related peptides, and anionic moieties MERCK & CO. INC. (US) 1992-01-22 — — EP disclosed
US-5064563-A Hydrogen peroxide polymerization catalyst copper or iron ions and alkali to neutralize acid; detergent builder NIPPON SHOKUBAI CO., LTD. (JP) 1991-11-12 — — US disclosed
EP-0396303-A2 Process for producing and use of maleic acid (co-) polymer salt improved in biodegradability NIPPON SHOKUBAI CO., LTD. (JP) 1990-11-07 — — EP disclosed
EP-0368563-A2 Drilling fluid additives NIPPON SHOKUBAI CO., LTD. (JP) 1990-05-16 — — EP disclosed
EP-0337694-A2 Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer NIPPON SHOKUBAI CO., LTD. (JP) 1989-10-18 — — EP disclosed
US-4652621-A MALEIMIDE WITH SULFONATE OR SULFATE GROUP, DRILLING FLUID DISPERSANT NIPPON ZEON CO., LTD. (JP) 1987-03-24 — — US disclosed
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