Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.47 |
| ▸ | IDO1 | P14902 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.40 |
| ▸ | GFER | P55789 | 1/20 | 0.40 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | MEN1 | O00255 | 4/20 | 0.39 |
| ▸ | THRB | P10828 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.39 |
| ▸ | RECQL | P46063 | 2/20 | 0.39 |
| ▸ | CASP7 | P55210 | 2/20 | 0.39 |
| ▸ | USP2 | O75604 | 2/20 | 0.39 |
| ▸ | PKM | P14618 | 2/20 | 0.39 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.39 |
| ▸ | CASP6 | P55212 | 2/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1400225 | 0.87 | CASP7 (0.47) | KDM4EIDO1POLBKMT2AGFER | |
| SCHEMBL664622 | 0.82 | SMN1; SMN2 (0.50) | KDM4EPOLBKMT2AALDH1A1MAPT | |
| SCHEMBL8405155 | 0.77 | KDM4E (0.58) | KDM4EIDO1POLBKMT2AGFER | |
| SCHEMBL4997223 | 0.77 | KDM4E (0.56) | KDM4EIDO1POLBKMT2AGFER | |
| SCHEMBL712251 | 0.76 | KDM4E (0.61) | KDM4EIDO1POLBKMT2AGFER | |
| SCHEMBL1551912 | 0.75 | KDM4E (0.50) | KDM4EPOLBKMT2AGFERRXFP1 | |
| SCHEMBL26963250 | 0.75 | KDM4E (0.50) | KDM4EIDO1POLBKMT2AGFER | |
| SCHEMBL1554060 | 0.74 | KMT2A (0.59) | KDM4EIDO1POLBKMT2AGFER | |
| SCHEMBL28704965 | 0.73 | CYP3A4 (0.65) | KDM4EPOLBKMT2AGFERRXFP1 | |
| SCHEMBL28902260 | 0.73 | KDM4E (0.48) | KDM4EIDO1POLBKMT2AGFER |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119775947-A | Adhesive, and preparation method and application thereof | 深圳市研一新材料有限责任公司 | 2025-04-08 | — | — | CN | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| CN-119775947-A | Adhesive, and preparation method and application thereof | 深圳市研一新材料有限责任公司 | 2025-04-08 | — | — | CN | disclosed |
| CN-119585651-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2025-03-07 | — | — | CN | disclosed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| CN-118525024-A | Condensed ring thiophene compound and composition for forming wavelength conversion film containing same | 国立大学法人东海国立大学机构 | 2024-08-20 | — | — | CN | disclosed |
| CN-118318191-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| EP-1431822-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-20040048188-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-11 | — | — | US | disclosed |
| CN-1468391-A | Positive photosensitive polyimide resin composition | �ղ���ѧ��ҵ��ʽ���� | 2004-01-14 | — | — | CN | disclosed |
| US-6677099-B1 | POLYAMIDEIMIDE DEVELOPED BY AN AQUEOUS ALKALINE SOLUTION AND WHICH IS EXCELLENT IN THE DEVELOPABILITY AND THE ADHESION TO A SUBSTRATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |
| EP-0424940-B1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5288588-A | Containing diamine substituted with phenolic hydroxyl, carboxyl, thiophenol and/or sulfonic groups | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1994-02-22 | — | — | US | disclosed |
| EP-0424940-A2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1991-05-02 | — | — | EP | disclosed |